{"title":"栅极电流对 InAlN/GaN HEMT 射频功率性能的影响分析","authors":"Dongping Xiao;Dominique M. M.-P. Schreurs;Rana ElKashlan;Yang Zhang;Adam Cooman;Ahmad Khaled;Daanish Smellie;AliReza Alian;Muhammad Asad;Bertrand Parvais;Piet Wambacq;Uthayasankaran Peralagu;Nadine Collaert","doi":"10.1109/TMTT.2024.3431196","DOIUrl":null,"url":null,"abstract":"Gate current is known to limit device performance, yet a detailed analysis of its impact on RF power performance has not been extensively documented. This article examines the influence of gate current on RF power performance. A small-signal equivalent-circuit analysis shows that gate current degrades the device’s RF power performance, with higher gate currents causing greater degradation. In addition, the effect of gate current varies with frequency due to the frequency-dependent impedance of <inline-formula> <tex-math>$C_{\\text {gs}}$ </tex-math></inline-formula> and <inline-formula> <tex-math>$C_{\\text {gd}}$ </tex-math></inline-formula>, resulting in more significant degradation at lower frequencies because of the parallel connection of gate conduction with these capacitors. These findings are validated under large-signal conditions using an experimentally verified device model for InAlN/GaN high-electron-mobility transistors (HEMTs).","PeriodicalId":13272,"journal":{"name":"IEEE Transactions on Microwave Theory and Techniques","volume":"73 2","pages":"779-788"},"PeriodicalIF":4.5000,"publicationDate":"2024-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Analysis of the Gate Current’s Influence on the RF Power Performance of InAlN/GaN HEMTs\",\"authors\":\"Dongping Xiao;Dominique M. M.-P. Schreurs;Rana ElKashlan;Yang Zhang;Adam Cooman;Ahmad Khaled;Daanish Smellie;AliReza Alian;Muhammad Asad;Bertrand Parvais;Piet Wambacq;Uthayasankaran Peralagu;Nadine Collaert\",\"doi\":\"10.1109/TMTT.2024.3431196\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Gate current is known to limit device performance, yet a detailed analysis of its impact on RF power performance has not been extensively documented. This article examines the influence of gate current on RF power performance. A small-signal equivalent-circuit analysis shows that gate current degrades the device’s RF power performance, with higher gate currents causing greater degradation. In addition, the effect of gate current varies with frequency due to the frequency-dependent impedance of <inline-formula> <tex-math>$C_{\\\\text {gs}}$ </tex-math></inline-formula> and <inline-formula> <tex-math>$C_{\\\\text {gd}}$ </tex-math></inline-formula>, resulting in more significant degradation at lower frequencies because of the parallel connection of gate conduction with these capacitors. These findings are validated under large-signal conditions using an experimentally verified device model for InAlN/GaN high-electron-mobility transistors (HEMTs).\",\"PeriodicalId\":13272,\"journal\":{\"name\":\"IEEE Transactions on Microwave Theory and Techniques\",\"volume\":\"73 2\",\"pages\":\"779-788\"},\"PeriodicalIF\":4.5000,\"publicationDate\":\"2024-08-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Transactions on Microwave Theory and Techniques\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10619991/\",\"RegionNum\":1,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Microwave Theory and Techniques","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10619991/","RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Analysis of the Gate Current’s Influence on the RF Power Performance of InAlN/GaN HEMTs
Gate current is known to limit device performance, yet a detailed analysis of its impact on RF power performance has not been extensively documented. This article examines the influence of gate current on RF power performance. A small-signal equivalent-circuit analysis shows that gate current degrades the device’s RF power performance, with higher gate currents causing greater degradation. In addition, the effect of gate current varies with frequency due to the frequency-dependent impedance of $C_{\text {gs}}$ and $C_{\text {gd}}$ , resulting in more significant degradation at lower frequencies because of the parallel connection of gate conduction with these capacitors. These findings are validated under large-signal conditions using an experimentally verified device model for InAlN/GaN high-electron-mobility transistors (HEMTs).
期刊介绍:
The IEEE Transactions on Microwave Theory and Techniques focuses on that part of engineering and theory associated with microwave/millimeter-wave components, devices, circuits, and systems involving the generation, modulation, demodulation, control, transmission, and detection of microwave signals. This includes scientific, technical, and industrial, activities. Microwave theory and techniques relates to electromagnetic waves usually in the frequency region between a few MHz and a THz; other spectral regions and wave types are included within the scope of the Society whenever basic microwave theory and techniques can yield useful results. Generally, this occurs in the theory of wave propagation in structures with dimensions comparable to a wavelength, and in the related techniques for analysis and design.