基于 GaSb-Si 异质结的垂直 TFET 的光学评估

IF 2.7 Q2 PHYSICS, CONDENSED MATTER Micro and Nanostructures Pub Date : 2024-08-18 DOI:10.1016/j.micrna.2024.207955
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引用次数: 0

摘要

本文研究了基于 III/V 族锑化镓(GaSb)-硅的异质堆叠垂直 TFET 在可见光谱内各种波长下的电学和光传感分析。首先,提取漏极电流、能带图和电子密度等值线图,以研究器件的直流和电气行为。然后,通过改变源边厚度来评估其性能,并观察器件的隧道率。此外,通过计算灵敏度 (Sn)、噪声系数和高效特性等关键光学参数,还注意到了该器件的光电应用。最后,还列出了一个比较表,以设定基准并强调异质堆栈 TFET 的重要性。据报告,该器件在 320 纳米波长下的最大灵敏度约为 25.2,响应率 (R) 为 0.8 A/Watt 。此外,我们还分别考察了栅-沟道、隔离器-沟道和源-沟道界面在光状态下陷阱电荷的影响。
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Optical assessment of vertical TFET based on heterojunction of GaSb-Si

This paper investigates the electrical and opto-sensing analysis of hetero stack vertical TFETs based on III/V group Gallium antimonide (GaSb)-Si at various wavelengths within the visible spectrum. Initially, the drain current, energy band diagram, and electron density contour plot are extracted in order to study the DC and electrical behavior of the device. Following that, their performance is evaluated by altering the source side thickness and observe the tunneling rate of device. Furthermore, the photo application of the device is noticed by computing the critical optical parameter such as sensitivity (Sn), noise factor, and efficient characteristics. Finally, a comparative table is included to set the benchmark and highlight the importance of hetero stack TFET. The device's maximum reported sensitivity is approximately 25.2 and responsivity (R) is 0.8 A/Watt at 320 nm wavelength. Additionally, we examined the effect of trap charges under light state at the gate-channel, isolator-channel, and source-channel interface respectively.

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