{"title":"布里奇曼法生长的高温稳定相二卤化锗(GeS2)单晶的光学透过率范围","authors":"Masaru Nakamura, Yoshitaka Matsushita","doi":"10.1016/j.jcrysgro.2024.127878","DOIUrl":null,"url":null,"abstract":"<div><p>A high-temperature (HT) stable phase germanium dichalcogenide (GeS<sub>2</sub>) was grown in an evacuated quartz ampoule to investigate its transparency range. First, as a starting material for the crystal growth of HT-GeS<sub>2</sub>, GeS<sub>2</sub> glass containing HT-GeS<sub>2</sub> crystals was synthesized using our previously improved process for synthesizing polycrystalline sulfide compounds in a conventional horizontal furnace. The HT-GeS<sub>2</sub> crystal was grown using the Bridgman method under a temperature gradient of 20–30 °C/cm. The grown HT-GeS<sub>2</sub> single crystal was easily cleaved along the growth direction, and this cleaved surface was identified as the (001) face using X-ray diffraction (XRD). Single-crystal XRD analysis confirmed the growth of an HT-GeS<sub>2</sub> single crystal with a monoclinic structure (space group <em>P</em>2<sub>1</sub>/c) and lattice parameters of <em>a</em> = 6.7061(4) Å, <em>b</em> = 16.0877(13) Å, and <em>c</em> = 11.4242(11) Å, and <em>β</em> = 91.069 (8)°. The optical transmittance spectra of the HT-GeS<sub>2</sub> single crystal were measured in the visible and infrared (IR) regions, revealing a transparency range of 0.36–22.5 μm. Differential thermal analysis revealed the melting point of HT-GeS<sub>2</sub> as 841 ± 1 °C. The HT-GeS<sub>2</sub> single crystal is expected to be a new candidate for IR optical crystal.</p></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"647 ","pages":"Article 127878"},"PeriodicalIF":1.7000,"publicationDate":"2024-09-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Optical transmittance range of High-Temperature stable phase germanium dichalcogenide (GeS2) single crystal grown by the Bridgman method\",\"authors\":\"Masaru Nakamura, Yoshitaka Matsushita\",\"doi\":\"10.1016/j.jcrysgro.2024.127878\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>A high-temperature (HT) stable phase germanium dichalcogenide (GeS<sub>2</sub>) was grown in an evacuated quartz ampoule to investigate its transparency range. First, as a starting material for the crystal growth of HT-GeS<sub>2</sub>, GeS<sub>2</sub> glass containing HT-GeS<sub>2</sub> crystals was synthesized using our previously improved process for synthesizing polycrystalline sulfide compounds in a conventional horizontal furnace. The HT-GeS<sub>2</sub> crystal was grown using the Bridgman method under a temperature gradient of 20–30 °C/cm. The grown HT-GeS<sub>2</sub> single crystal was easily cleaved along the growth direction, and this cleaved surface was identified as the (001) face using X-ray diffraction (XRD). Single-crystal XRD analysis confirmed the growth of an HT-GeS<sub>2</sub> single crystal with a monoclinic structure (space group <em>P</em>2<sub>1</sub>/c) and lattice parameters of <em>a</em> = 6.7061(4) Å, <em>b</em> = 16.0877(13) Å, and <em>c</em> = 11.4242(11) Å, and <em>β</em> = 91.069 (8)°. The optical transmittance spectra of the HT-GeS<sub>2</sub> single crystal were measured in the visible and infrared (IR) regions, revealing a transparency range of 0.36–22.5 μm. Differential thermal analysis revealed the melting point of HT-GeS<sub>2</sub> as 841 ± 1 °C. The HT-GeS<sub>2</sub> single crystal is expected to be a new candidate for IR optical crystal.</p></div>\",\"PeriodicalId\":353,\"journal\":{\"name\":\"Journal of Crystal Growth\",\"volume\":\"647 \",\"pages\":\"Article 127878\"},\"PeriodicalIF\":1.7000,\"publicationDate\":\"2024-09-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Crystal Growth\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0022024824003130\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"CRYSTALLOGRAPHY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Crystal Growth","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0022024824003130","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"CRYSTALLOGRAPHY","Score":null,"Total":0}
Optical transmittance range of High-Temperature stable phase germanium dichalcogenide (GeS2) single crystal grown by the Bridgman method
A high-temperature (HT) stable phase germanium dichalcogenide (GeS2) was grown in an evacuated quartz ampoule to investigate its transparency range. First, as a starting material for the crystal growth of HT-GeS2, GeS2 glass containing HT-GeS2 crystals was synthesized using our previously improved process for synthesizing polycrystalline sulfide compounds in a conventional horizontal furnace. The HT-GeS2 crystal was grown using the Bridgman method under a temperature gradient of 20–30 °C/cm. The grown HT-GeS2 single crystal was easily cleaved along the growth direction, and this cleaved surface was identified as the (001) face using X-ray diffraction (XRD). Single-crystal XRD analysis confirmed the growth of an HT-GeS2 single crystal with a monoclinic structure (space group P21/c) and lattice parameters of a = 6.7061(4) Å, b = 16.0877(13) Å, and c = 11.4242(11) Å, and β = 91.069 (8)°. The optical transmittance spectra of the HT-GeS2 single crystal were measured in the visible and infrared (IR) regions, revealing a transparency range of 0.36–22.5 μm. Differential thermal analysis revealed the melting point of HT-GeS2 as 841 ± 1 °C. The HT-GeS2 single crystal is expected to be a new candidate for IR optical crystal.
期刊介绍:
The journal offers a common reference and publication source for workers engaged in research on the experimental and theoretical aspects of crystal growth and its applications, e.g. in devices. Experimental and theoretical contributions are published in the following fields: theory of nucleation and growth, molecular kinetics and transport phenomena, crystallization in viscous media such as polymers and glasses; crystal growth of metals, minerals, semiconductors, superconductors, magnetics, inorganic, organic and biological substances in bulk or as thin films; molecular beam epitaxy, chemical vapor deposition, growth of III-V and II-VI and other semiconductors; characterization of single crystals by physical and chemical methods; apparatus, instrumentation and techniques for crystal growth, and purification methods; multilayer heterostructures and their characterisation with an emphasis on crystal growth and epitaxial aspects of electronic materials. A special feature of the journal is the periodic inclusion of proceedings of symposia and conferences on relevant aspects of crystal growth.