{"title":"表面疏水性诱导的电化学氮还原反应:泡沫铜与铜箔的基底依赖性案例研究","authors":"Ashmita Biswas, Ramendra Sundar Dey","doi":"10.1007/s12039-024-02299-x","DOIUrl":null,"url":null,"abstract":"<div><p>Hydrophobic surface modification is an emerging concept for electrochemical gas-phase reactions like nitrogen reduction reaction to ammonia as the restricted surface wettability helps to surpass the competitive hydrogen evolution reaction. However, the extensive studies on this strategy lack a discussion on the influence of substrates on the stability of the hydrophobic coating. The present work summarizes a case study on the substrate-dependent electrochemical behaviour of the alkanethiol-coated flattened Cu foil and porous dendritic Cu foam surfaces. NRR studies reveal that the porous dendritic architecture with electrified tips and the hydrophobic coating-induced gas diffusion layer proved to be beneficial for NRR activity in Cu foam-SH. However, for a prolonged experimental hour, the flattened surface of the Cu foil could better hold the hydrophobic coating. The results corresponded with water contact angle as well as double layer capacitance measurements and a detailed X-ray photoelectron spectroscopy study. It is supposed that the prolonged exposure to applied potential alters the polarization of the Cu dendritic tips and weakens the Cu–S bond, loosening the alkanethiol layer over Cu foam.</p><h3>Graphical abstract</h3><p>Hydrophobic Cu substrates facilitate electrochemical nitrogen reduction reactions owing to the better N<sub>2</sub> diffusion and trapping underneath the hydrophobic coating. While the NRR activity gets accelerated at the electrified dendritic tips of Cu foam, the steady hydrophobic layer over the flattened Cu foil surface ascertains long-term use of the material.\n</p><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":616,"journal":{"name":"Journal of Chemical Sciences","volume":null,"pages":null},"PeriodicalIF":1.7000,"publicationDate":"2024-08-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Surface hydrophobicity induced electrochemical nitrogen reduction reaction: A substrate-dependent case study on Cu foam versus Cu foil\",\"authors\":\"Ashmita Biswas, Ramendra Sundar Dey\",\"doi\":\"10.1007/s12039-024-02299-x\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Hydrophobic surface modification is an emerging concept for electrochemical gas-phase reactions like nitrogen reduction reaction to ammonia as the restricted surface wettability helps to surpass the competitive hydrogen evolution reaction. However, the extensive studies on this strategy lack a discussion on the influence of substrates on the stability of the hydrophobic coating. The present work summarizes a case study on the substrate-dependent electrochemical behaviour of the alkanethiol-coated flattened Cu foil and porous dendritic Cu foam surfaces. NRR studies reveal that the porous dendritic architecture with electrified tips and the hydrophobic coating-induced gas diffusion layer proved to be beneficial for NRR activity in Cu foam-SH. However, for a prolonged experimental hour, the flattened surface of the Cu foil could better hold the hydrophobic coating. The results corresponded with water contact angle as well as double layer capacitance measurements and a detailed X-ray photoelectron spectroscopy study. It is supposed that the prolonged exposure to applied potential alters the polarization of the Cu dendritic tips and weakens the Cu–S bond, loosening the alkanethiol layer over Cu foam.</p><h3>Graphical abstract</h3><p>Hydrophobic Cu substrates facilitate electrochemical nitrogen reduction reactions owing to the better N<sub>2</sub> diffusion and trapping underneath the hydrophobic coating. While the NRR activity gets accelerated at the electrified dendritic tips of Cu foam, the steady hydrophobic layer over the flattened Cu foil surface ascertains long-term use of the material.\\n</p><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>\",\"PeriodicalId\":616,\"journal\":{\"name\":\"Journal of Chemical Sciences\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":1.7000,\"publicationDate\":\"2024-08-24\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Chemical Sciences\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s12039-024-02299-x\",\"RegionNum\":4,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"CHEMISTRY, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Chemical Sciences","FirstCategoryId":"92","ListUrlMain":"https://link.springer.com/article/10.1007/s12039-024-02299-x","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
摘要
疏水表面改性是氮还原成氨等电化学气相反应的新兴概念,因为受限的表面润湿性有助于超越竞争性氢进化反应。然而,对这一策略的广泛研究缺乏对基底对疏水涂层稳定性影响的讨论。本研究总结了烷硫醇涂层扁平铜箔和多孔树枝状泡沫铜表面的电化学行为与基底有关的案例研究。核磁共振研究表明,多孔树枝状结构的带电尖端和疏水涂层引起的气体扩散层有利于泡沫铜-SH 中的核磁共振活性。然而,在实验时间较长的情况下,铜箔的扁平表面能更好地保持疏水涂层。这些结果与水接触角、双层电容测量和详细的 X 射线光电子能谱研究结果相吻合。图文并茂的摘要疏水铜基底有利于电化学氮还原反应,因为疏水涂层下的 N2 扩散和捕获效果更好。虽然在泡沫铜的电化树枝状尖端加速了氮还原活性,但扁平铜箔表面的稳定疏水层确保了材料的长期使用。
Surface hydrophobicity induced electrochemical nitrogen reduction reaction: A substrate-dependent case study on Cu foam versus Cu foil
Hydrophobic surface modification is an emerging concept for electrochemical gas-phase reactions like nitrogen reduction reaction to ammonia as the restricted surface wettability helps to surpass the competitive hydrogen evolution reaction. However, the extensive studies on this strategy lack a discussion on the influence of substrates on the stability of the hydrophobic coating. The present work summarizes a case study on the substrate-dependent electrochemical behaviour of the alkanethiol-coated flattened Cu foil and porous dendritic Cu foam surfaces. NRR studies reveal that the porous dendritic architecture with electrified tips and the hydrophobic coating-induced gas diffusion layer proved to be beneficial for NRR activity in Cu foam-SH. However, for a prolonged experimental hour, the flattened surface of the Cu foil could better hold the hydrophobic coating. The results corresponded with water contact angle as well as double layer capacitance measurements and a detailed X-ray photoelectron spectroscopy study. It is supposed that the prolonged exposure to applied potential alters the polarization of the Cu dendritic tips and weakens the Cu–S bond, loosening the alkanethiol layer over Cu foam.
Graphical abstract
Hydrophobic Cu substrates facilitate electrochemical nitrogen reduction reactions owing to the better N2 diffusion and trapping underneath the hydrophobic coating. While the NRR activity gets accelerated at the electrified dendritic tips of Cu foam, the steady hydrophobic layer over the flattened Cu foil surface ascertains long-term use of the material.
期刊介绍:
Journal of Chemical Sciences is a monthly journal published by the Indian Academy of Sciences. It formed part of the original Proceedings of the Indian Academy of Sciences – Part A, started by the Nobel Laureate Prof C V Raman in 1934, that was split in 1978 into three separate journals. It was renamed as Journal of Chemical Sciences in 2004. The journal publishes original research articles and rapid communications, covering all areas of chemical sciences. A significant feature of the journal is its special issues, brought out from time to time, devoted to conference symposia/proceedings in frontier areas of the subject, held not only in India but also in other countries.