{"title":"基于 ASM-HEMT 的 GaN HEMT 与温度和栅极电压有关的 I-V 建模","authors":"Ziwei Zhou, Guipeng Liu, Guijuan Zhao","doi":"10.1088/1361-6641/ad6c7a","DOIUrl":null,"url":null,"abstract":"In this paper, a temperature- and gate voltage-dependent current–voltage (<italic toggle=\"yes\">I</italic>–<italic toggle=\"yes\">V</italic>) model for gallium nitride (GaN) high electron mobility transistors (HEMTs) devices is studied. To help researchers and designers simulate devices in the absence of experimental data and improve the parameter extraction efficiency, the temperature and gate voltage dependence of mobility are discussed and incorporated into the proposed model, which is revised from the standard advanced SPICE model (ASM) for GaN HEMTs. The mobility variations with the gate voltage from −2 V to 6 V and the temperature from 10 K to 1000 K are analyzed. The simulation results of our model are compared with the standard ASM-HEMT model, and the output and transfer characteristics of the device from 270 K to 420 K are simulated. Therefore, our model may simulate various applications of GaN HEMTs at different gate voltages and temperatures in the early stages of design and research.","PeriodicalId":21585,"journal":{"name":"Semiconductor Science and Technology","volume":null,"pages":null},"PeriodicalIF":1.9000,"publicationDate":"2024-08-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Temperature- and gate voltage-dependent I–V modeling of GaN HEMTs based on ASM-HEMT\",\"authors\":\"Ziwei Zhou, Guipeng Liu, Guijuan Zhao\",\"doi\":\"10.1088/1361-6641/ad6c7a\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, a temperature- and gate voltage-dependent current–voltage (<italic toggle=\\\"yes\\\">I</italic>–<italic toggle=\\\"yes\\\">V</italic>) model for gallium nitride (GaN) high electron mobility transistors (HEMTs) devices is studied. To help researchers and designers simulate devices in the absence of experimental data and improve the parameter extraction efficiency, the temperature and gate voltage dependence of mobility are discussed and incorporated into the proposed model, which is revised from the standard advanced SPICE model (ASM) for GaN HEMTs. The mobility variations with the gate voltage from −2 V to 6 V and the temperature from 10 K to 1000 K are analyzed. The simulation results of our model are compared with the standard ASM-HEMT model, and the output and transfer characteristics of the device from 270 K to 420 K are simulated. Therefore, our model may simulate various applications of GaN HEMTs at different gate voltages and temperatures in the early stages of design and research.\",\"PeriodicalId\":21585,\"journal\":{\"name\":\"Semiconductor Science and Technology\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":1.9000,\"publicationDate\":\"2024-08-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Semiconductor Science and Technology\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://doi.org/10.1088/1361-6641/ad6c7a\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Semiconductor Science and Technology","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1088/1361-6641/ad6c7a","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
摘要
本文研究了氮化镓(GaN)高电子迁移率晶体管(HEMT)器件与温度和栅极电压有关的电流电压(I-V)模型。为了帮助研究人员和设计人员在缺乏实验数据的情况下模拟器件并提高参数提取效率,本文讨论了迁移率与温度和栅极电压的关系,并将其纳入了所提出的模型,该模型是在氮化镓高电子迁移率晶体管的标准高级 SPICE 模型 (ASM) 基础上修订而成的。分析了栅极电压从 -2 V 到 6 V 以及温度从 10 K 到 1000 K 时的迁移率变化。我们将模型的模拟结果与标准 ASM-HEMT 模型进行了比较,并模拟了器件在 270 K 至 420 K 温度范围内的输出和传输特性。因此,在设计和研究的早期阶段,我们的模型可以模拟 GaN HEMT 在不同栅极电压和温度下的各种应用。
Temperature- and gate voltage-dependent I–V modeling of GaN HEMTs based on ASM-HEMT
In this paper, a temperature- and gate voltage-dependent current–voltage (I–V) model for gallium nitride (GaN) high electron mobility transistors (HEMTs) devices is studied. To help researchers and designers simulate devices in the absence of experimental data and improve the parameter extraction efficiency, the temperature and gate voltage dependence of mobility are discussed and incorporated into the proposed model, which is revised from the standard advanced SPICE model (ASM) for GaN HEMTs. The mobility variations with the gate voltage from −2 V to 6 V and the temperature from 10 K to 1000 K are analyzed. The simulation results of our model are compared with the standard ASM-HEMT model, and the output and transfer characteristics of the device from 270 K to 420 K are simulated. Therefore, our model may simulate various applications of GaN HEMTs at different gate voltages and temperatures in the early stages of design and research.
期刊介绍:
Devoted to semiconductor research, Semiconductor Science and Technology''s multidisciplinary approach reflects the far-reaching nature of this topic.
The scope of the journal covers fundamental and applied experimental and theoretical studies of the properties of non-organic, organic and oxide semiconductors, their interfaces and devices, including:
fundamental properties
materials and nanostructures
devices and applications
fabrication and processing
new analytical techniques
simulation
emerging fields:
materials and devices for quantum technologies
hybrid structures and devices
2D and topological materials
metamaterials
semiconductors for energy
flexible electronics.