GO 包裹的铜/铁双金属 MOF 复合材料对水溶液中铀 (VI) 的吸附作用

IF 1.7 3区 化学 Q3 CHEMISTRY, ANALYTICAL Journal of Radioanalytical and Nuclear Chemistry Pub Date : 2024-08-23 DOI:10.1007/s10967-024-09638-9
Xuan Yang, Jinlu Chen, Dongyang Xu, Zui Tao, Jun Liu, Songbo Tan, Lianyun Wang, Fangzhu Xiao, Guowen Peng
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摘要

本研究对 MIL-101(铁、铜)/GO 吸附和去除废水中 U(VI)的热力学和动力学进行了研究。系统研究了 pH 值、接触时间、初始浓度和吸附温度的影响。结果表明,MOF 对 U(VI)具有有效的吸附能力。利用不同的等温线和动力学模型对 U(VI) 的吸附进行了分析。结果表明,MIL-101(Fe, Cu)/GO 对 U(VI)的吸附遵循 Langmuir 吸附等温线和准二阶动力学模型。热力学研究(ΔG <0,ΔH <0)表明,吸附过程是放热和自发的。研究结果表明,MIL-101(Fe, Cu)/GO 在吸附和去除铀(VI)方面具有广阔的应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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Uranium (VI) adsorption from aqueous solution by GO wrapped Cu/Fe bimetallic MOF composites

In this study, the thermodynamics and kinetics of U(VI) adsorption and removal on MIL-101(Fe, Cu)/GO from wastewater were studied. The effects of pH, contact time, initial concentration and adsorption temperature were systematically studied. The results showed an effective U(VI) adsorption capacity of the MOF. The adsorption of U(VI) was analyzed by using different isotherms as well as various kinetics models. The results showed that Langmuir adsorption isotherm and quasi-second-order kinetic model were followed by the adsorption of U(VI) on MIL-101(Fe, Cu)/GO. Thermodynamic studies (ΔG < 0, ΔH < 0) demonstrated that the adsorption process is exothermic and spontaneous. The results revealed that MIL-101(Fe, Cu)/GO has a real prospect for the application in the adsorption and removal of U(VI).

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来源期刊
CiteScore
2.80
自引率
18.80%
发文量
504
审稿时长
2.2 months
期刊介绍: An international periodical publishing original papers, letters, review papers and short communications on nuclear chemistry. The subjects covered include: Nuclear chemistry, Radiochemistry, Radiation chemistry, Radiobiological chemistry, Environmental radiochemistry, Production and control of radioisotopes and labelled compounds, Nuclear power plant chemistry, Nuclear fuel chemistry, Radioanalytical chemistry, Radiation detection and measurement, Nuclear instrumentation and automation, etc.
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