带纹理壁的狭缝微通道的流体动力阻力研究

IF 0.8 4区物理与天体物理 Q4 PHYSICS, APPLIED Technical Physics Letters Pub Date : 2024-08-29 DOI:10.1134/s1063785023180104

A. S. Lobasov, A. V. Minakov

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引用次数: 0

摘要

摘要本文介绍了对带有纹理壁面的狭缝微通道的流体动力阻力以及该通道中的压降和不同雷诺数下壁面上的有效滑移长度进行数值研究的结果。通道高度为 10 微米，长度从 25 微米到 500 微米不等。结果发现，在任何长度上，纹理微通道中的压降都小于传统通道。在不同长度的通道中，获得了相对压降、摩擦因数和有效滑移长度对雷诺数的依赖关系。提出了一种相关关系，用于描述小长度通道的相对压降与雷诺数的关系。摩擦因数用相关系数 20/Re 表示。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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The Investigation of the Hydrodynamic Drag of a Slit Microchannel with a Textured Wall

Abstract

The results of numerical investigation of the hydrodynamic drag of a slit microchannel with a textured wall surface, as well as of the pressure drop in such a channel and the effective slip length on the wall for various Reynolds numbers, are presented. The channel height was 10 μm, and the length varied from 25 to 500 μm. It was found that the pressure drop in the textured microchannel was less than in a conventional one at any length. The dependences of the relative pressure drop, friction factor, and effective slip length on the Reynolds number were obtained for various channel lengths. A correlation that describes the dependence of the relative pressure drop on the Reynolds number for small channel lengths was proposed. The friction factor was described by a correlation expressed as 20/Re.

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来源期刊

Technical Physics Letters 物理-物理：应用

CiteScore

1.50

自引率

0.00%

发文量

审稿时长

2-4 weeks

期刊介绍： Technical Physics Letters is a companion journal to Technical Physics and offers rapid publication of developments in theoretical and experimental physics with potential technological applications. Recent emphasis has included many papers on gas lasers and on lasing in semiconductors, as well as many reports on high Tc superconductivity. The excellent coverage of plasma physics seen in the parent journal, Technical Physics, is also present here with quick communication of developments in theoretical and experimental work in all fields with probable technical applications. Topics covered are basic and applied physics; plasma physics; solid state physics; physical electronics; accelerators; microwave electron devices; holography.