Growth of CuO NPs layers on TiO2 NTs using vacuum thermal evaporation

CuO/TiO₂ composites have been reported to exhibit higher potential for various applications (electronics, energy storage, and sensor technology…). This study investigates the impact of different film thicknesses on the properties of CuO NPs on TiO₂ NTs. CuO NPs were deposited onto TiO₂ NTs using vacuum thermal evaporation, with thicknesses ranging from 5 to 30 nm. A quartz crystal monitor measured evaporation rate and film thickness at a substrate temperature of 350 °C. Following the deposition process, the samples were thermally treated through air annealing at 400 °C for 1 h.

XRD analysis showed that all films had an anatase phase. The annealed sample also had a confirmed CuO phase, indicating good crystallinity. Crystallite size and strain varied with film thickness, assessed using the Williamson-Hall method and Rietveld refinement. The deposition and distribution of CuO on TiO₂ NTs were verified using Scanning Electron Microscopy (SEM) combined with energy dispersive spectroscopy (EDS). Optimizing the materials nanostructures requires controlling film thickness and annealing. Insights from this study can improve nanomaterial fabrication techniques, which could enhance their performance in technological applications.