三元五边形碲化镉单层中两种带边排列的选择性切换:原子沟谷锁定

Zhi-Qiang Wen, Qiu Yang, Shu-Hao Cao, Zhao-Yi Zeng, Hua-Yun Geng, Xiang-Rong Chen
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引用次数: 0

摘要

在光催化水分离领域,目前还没有研究明确探讨过二维(2D)材料在固有电场作用下多种带边排列共存的问题。在这封信中,我们设计了三元五边形碲化镉(CdSeTe)单层,并提出了一种称为 "原子谷锁定"(atom-valley locking)的新概念,它可以提供多个带边排列。在 CdSeTe 单层中,电子结构中出现了两个不同的谷,一个由 Se 原子产生,另一个由 Te 原子产生,它们之间的自发极化为 187 meV。这一现象可归因于谷电子的局域化和折叠旋转反射对称性的破坏,但它并不依赖于时间反转对称性的破坏。由于谷电子分布与原子有关,因此可以识别出两种带边排列方式。此外,还可以通过应变工程实现它们之间的选择性切换,从而实现对氢进化反应场所的精确控制。我们的发现为探索谷极化开辟了新的机遇,并为具有内在电场的二维材料的光催化应用提供了独特的见解。
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Selective Switching Between Two Band-Edge Alignments in Ternary Pentagonal CdSeTe Monolayer: Atom-Valley Locking
In the field of photocatalytic water splitting, no current studies have explicitly investigated the coexistence of multiple band-edge alignments in two-dimensional (2D) materials with intrinsic electric fields. In this Letter, we designed the ternary pentagonal CdSeTe monolayer, and proposed a novel concept called atom-valley locking, which could provide multiple band-edge positions. In the CdSeTe monolayer, two distinct valleys emerge in the electronic structure, one contributed by Se atoms and the other by Te atoms, with a spontaneous polarization of 187 meV between them. This phenomenon can be attributed to the localization of valley electrons and the breaking of four-fold rotational reflection symmetry, yet it does not rely on the breaking of time-reversal symmetry. Due to the atom-dependent valley distribution, two types of band-edge alignments can be identified. Moreover, selective switching between them can be achieved by strain engineering, thereby enabling precise control over the site of the hydrogen evolution reaction. Our findings open up new opportunities for exploring valley polarization and provide unique insights into the photocatalytic applications of 2D materials with intrinsic electric fields.
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