带磁镜的弯曲陷阱中电子束运动的三维模拟

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS IEEE Transactions on Plasma Science Pub Date : 2024-09-17 DOI:10.1109/TPS.2024.3412936
Xiao-Jing Zhang;Fang-Ping Wang;Wen-Shan Duan
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引用次数: 0

摘要

以往关于非对称磁镜中带电粒子动力学的研究主要使用二维模型。然而,使用二维模型研究带电粒子在不对称磁镜中的束缚可能缺乏有效性。本文利用三维粒子入胞(PIC)方法解决了这一局限性。文章介绍了电子束在带磁镜的弯曲阱中的束缚时间与各种束流参数的关系,包括初始电子数密度、电子温度、初始束流速度和初始束流速度方向。从所展示的三维轨迹中可以看出电子在磁镜中的两种振荡:拉莫尔回旋振荡和线圈间的往复反射。所展示的结果可用于设计更高效的磁镜,以限制电子和其他带电粒子。
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Three-Dimensional Simulation of Electron Beam Motion in Bent Trap With Magnetic Mirrors
Previous studies on the dynamics of charged particles in an asymmetric magnetic mirror mainly used a 2-D model. However, using a 2-D model to study the confinement of charged particles in an asymmetric mirror may lack validity. This article addresses this limitation using the 3-D particle-in-cell (PIC) method. The dependence of the confinement time of an electron beam in a bent trap with a magnetic mirror on various beam parameters is presented, including initial electron number density, electron temperature, initial beam speed, and initial beam velocity direction. Two types of oscillations of the electrons in the magnetic mirror are revealed from the presented 3-D trajectories: Larmor cyclotron oscillation and reciprocal reflection between coils. The presented results have potential applications in designing more efficient magnetic mirrors to confine electrons and other charged particles.
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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IEEE Transactions on Plasma Science Publication Information Table of Contents IEEE Transactions on Plasma Science Information for Authors Blank Page IEEE Transactions on Plasma Science Information for Authors
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