Elena Blundo, Marzia Cuccu, Federico Tuzi, Michele Re Fiorentin, Giorgio Pettinari, Atanu Patra, Salvatore Cianci, Zakhar Kudrynskyi, Marco Felici, Takashi Taniguchi, Kenji Watanabe, Amalia Patanè, Maurizia Palummo, Antonio Polimeni
{"title":"应变工程 InSe/MS$_2$(M=Mo,W)范德华异质结构中的巨型光发射增强效应","authors":"Elena Blundo, Marzia Cuccu, Federico Tuzi, Michele Re Fiorentin, Giorgio Pettinari, Atanu Patra, Salvatore Cianci, Zakhar Kudrynskyi, Marco Felici, Takashi Taniguchi, Kenji Watanabe, Amalia Patanè, Maurizia Palummo, Antonio Polimeni","doi":"arxiv-2409.09799","DOIUrl":null,"url":null,"abstract":"Two-dimensional crystals stack together through weak van der Waals (vdW)\nforces, offering unlimited possibilities to play with layer number, order and\ntwist angle in vdW heterostructures (HSs). The realisation of high-performance\noptoelectronic devices, however, requires the achievement of specific band\nalignments, $k$-space matching between conduction band minima and valence band\nmaxima, as well as efficient charge transfer between the constituent layers.\nFine tuning mechanisms to design ideal HSs are lacking. Here, we show that\nlayer-selective strain engineering can be exploited as an extra degree of\nfreedom in vdW HSs to tailor their band alignment and optical properties. To\nthat end, strain is selectively applied to MS$_2$ (M=Mo,W) monolayers in\nInSe/MS$_2$ HSs. This triggers a giant PL enhancement of the highly tuneable\nbut weakly emitting InSe by one to three orders of magnitude. Resonant PL\nexcitation measurements, supported by first-principle calculations, provide\nevidence of a strain-activated direct charge transfer from the MS$_2$ MLs\ntoward InSe. This significant emission enhancement achieved for InSe widens its\nrange of applications for optoelectronics.","PeriodicalId":501137,"journal":{"name":"arXiv - PHYS - Mesoscale and Nanoscale Physics","volume":"17 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Giant light emission enhancement in strain-engineered InSe/MS$_2$ (M=Mo,W) van der Waals heterostructures\",\"authors\":\"Elena Blundo, Marzia Cuccu, Federico Tuzi, Michele Re Fiorentin, Giorgio Pettinari, Atanu Patra, Salvatore Cianci, Zakhar Kudrynskyi, Marco Felici, Takashi Taniguchi, Kenji Watanabe, Amalia Patanè, Maurizia Palummo, Antonio Polimeni\",\"doi\":\"arxiv-2409.09799\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Two-dimensional crystals stack together through weak van der Waals (vdW)\\nforces, offering unlimited possibilities to play with layer number, order and\\ntwist angle in vdW heterostructures (HSs). The realisation of high-performance\\noptoelectronic devices, however, requires the achievement of specific band\\nalignments, $k$-space matching between conduction band minima and valence band\\nmaxima, as well as efficient charge transfer between the constituent layers.\\nFine tuning mechanisms to design ideal HSs are lacking. Here, we show that\\nlayer-selective strain engineering can be exploited as an extra degree of\\nfreedom in vdW HSs to tailor their band alignment and optical properties. To\\nthat end, strain is selectively applied to MS$_2$ (M=Mo,W) monolayers in\\nInSe/MS$_2$ HSs. This triggers a giant PL enhancement of the highly tuneable\\nbut weakly emitting InSe by one to three orders of magnitude. Resonant PL\\nexcitation measurements, supported by first-principle calculations, provide\\nevidence of a strain-activated direct charge transfer from the MS$_2$ MLs\\ntoward InSe. This significant emission enhancement achieved for InSe widens its\\nrange of applications for optoelectronics.\",\"PeriodicalId\":501137,\"journal\":{\"name\":\"arXiv - PHYS - Mesoscale and Nanoscale Physics\",\"volume\":\"17 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-09-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"arXiv - PHYS - Mesoscale and Nanoscale Physics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/arxiv-2409.09799\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"arXiv - PHYS - Mesoscale and Nanoscale Physics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/arxiv-2409.09799","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Giant light emission enhancement in strain-engineered InSe/MS$_2$ (M=Mo,W) van der Waals heterostructures
Two-dimensional crystals stack together through weak van der Waals (vdW)
forces, offering unlimited possibilities to play with layer number, order and
twist angle in vdW heterostructures (HSs). The realisation of high-performance
optoelectronic devices, however, requires the achievement of specific band
alignments, $k$-space matching between conduction band minima and valence band
maxima, as well as efficient charge transfer between the constituent layers.
Fine tuning mechanisms to design ideal HSs are lacking. Here, we show that
layer-selective strain engineering can be exploited as an extra degree of
freedom in vdW HSs to tailor their band alignment and optical properties. To
that end, strain is selectively applied to MS$_2$ (M=Mo,W) monolayers in
InSe/MS$_2$ HSs. This triggers a giant PL enhancement of the highly tuneable
but weakly emitting InSe by one to three orders of magnitude. Resonant PL
excitation measurements, supported by first-principle calculations, provide
evidence of a strain-activated direct charge transfer from the MS$_2$ MLs
toward InSe. This significant emission enhancement achieved for InSe widens its
range of applications for optoelectronics.