应变工程 InSe/MS$_2$(M=Mo,W)范德华异质结构中的巨型光发射增强效应

Elena Blundo, Marzia Cuccu, Federico Tuzi, Michele Re Fiorentin, Giorgio Pettinari, Atanu Patra, Salvatore Cianci, Zakhar Kudrynskyi, Marco Felici, Takashi Taniguchi, Kenji Watanabe, Amalia Patanè, Maurizia Palummo, Antonio Polimeni
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引用次数: 0

摘要

二维晶体通过微弱的范德华力(vdW)堆叠在一起,为在vdW异质结构(HS)中利用层数、阶次和扭曲角度提供了无限可能。然而,要实现高性能光电器件,需要实现特定的带排列、导带最小值和价带最大值之间的k$空间匹配,以及组成层之间有效的电荷转移。在这里,我们展示了在 vdW HS 中可以利用层选择性应变工程作为额外的自由度来定制它们的能带排列和光学特性。为此,我们选择性地将应变施加到 InSe/MS$_2$ HS 中的 MS$_2$ (M=Mo,W)单层上。这引发了高度可调但发射微弱的 InSe 的巨大 PL 增强,增强幅度达到一到三个数量级。在第一原理计算的支持下,共振聚光激发测量提供了应变激活直接电荷转移从 MS$_2$ ML 向 InSe 转移的证据。InSe 的这种显著的发射增强拓宽了其在光电子学方面的应用范围。
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Giant light emission enhancement in strain-engineered InSe/MS$_2$ (M=Mo,W) van der Waals heterostructures
Two-dimensional crystals stack together through weak van der Waals (vdW) forces, offering unlimited possibilities to play with layer number, order and twist angle in vdW heterostructures (HSs). The realisation of high-performance optoelectronic devices, however, requires the achievement of specific band alignments, $k$-space matching between conduction band minima and valence band maxima, as well as efficient charge transfer between the constituent layers. Fine tuning mechanisms to design ideal HSs are lacking. Here, we show that layer-selective strain engineering can be exploited as an extra degree of freedom in vdW HSs to tailor their band alignment and optical properties. To that end, strain is selectively applied to MS$_2$ (M=Mo,W) monolayers in InSe/MS$_2$ HSs. This triggers a giant PL enhancement of the highly tuneable but weakly emitting InSe by one to three orders of magnitude. Resonant PL excitation measurements, supported by first-principle calculations, provide evidence of a strain-activated direct charge transfer from the MS$_2$ MLs toward InSe. This significant emission enhancement achieved for InSe widens its range of applications for optoelectronics.
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