生成传统和反射式光子纳米射流,并通过它们的叠加改善强度增强效果

IF 3.1 3区 物理与天体物理 Q2 Engineering Optik Pub Date : 2024-09-18 DOI:10.1016/j.ijleo.2024.172047
Anamika Sharma, Arya Kumar Siddharth, Venkata Ramanaiah Dantham
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引用次数: 0

摘要

在此,我们报告了对基底支持的单球形介电微粒的光子纳米射流(PNJs)的理论研究。在金属和电介质基底上观察到了传统的和反射的光子纳米射流(CPNJs 和 RPNJs)。研究了 CPNJs 和 RPNJs 的最大电场强度增强(ηmax)与金属基底和介质微球之间的纳米间隙、金属基底的折射率以及入射光波长的关系。更重要的是,研究发现 CPNJ 和 RPNJ 之间的空间间隔与入射角 (θ) 密切相关。在掠入射情况下,当 CPNJ 和 RPNJ 叠加时,EFIE 有明显改善。理论研究还将金属基底替换为电介质基底,得出的结果在此进行比较。最后,这项研究扩展到介质基底上沉积的金属薄膜上的介质微球,并研究了 θ 对 CPNJ 和 RPNJ 特性参数的作用。
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Generation of conventional and reflective photonic nanojets and improving intensity enhancement with their superposition

Herein, we report the theoretical investigation on photonic nanojets (PNJs) of substrate-supported single-spherical dielectric microparticles. Conventional and reflective PNJs (CPNJs and RPNJs) are observed in the case of metal and dielectric substrates. The dependence of the maximum electric field intensity enhancement (ηmax) of the CPNJs and RPNJs on the nanogap between the metal substrate and dielectric microsphere, the metal substrate's refractive indices, and the incident light's wavelength is studied. More importantly, the spatial separation between the CPNJs and RPNJs is found to be strongly dependent upon the angle of incidence (θ). A significant improvement in the EFIE is observed for the grazing incidence upon the superposition of CPNJ and RPNJ. The theoretical investigation is also performed by replacing the metal substrate with a dielectric substrate, and the results obtained are reported here for comparison. Finally, this investigation is extended for the dielectric microsphere placed on a thin metal film deposited on a dielectric substrate and studied the role of θ on the characteristic parameters of the CPNJs and RPNJs.

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来源期刊
Optik
Optik 物理-光学
CiteScore
6.90
自引率
12.90%
发文量
1471
审稿时长
46 days
期刊介绍: Optik publishes articles on all subjects related to light and electron optics and offers a survey on the state of research and technical development within the following fields: Optics: -Optics design, geometrical and beam optics, wave optics- Optical and micro-optical components, diffractive optics, devices and systems- Photoelectric and optoelectronic devices- Optical properties of materials, nonlinear optics, wave propagation and transmission in homogeneous and inhomogeneous materials- Information optics, image formation and processing, holographic techniques, microscopes and spectrometer techniques, and image analysis- Optical testing and measuring techniques- Optical communication and computing- Physiological optics- As well as other related topics.
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