用于降解干扰肺部器官的 MB 染料的异质三元纳米复合光催化剂 BiFeO3-Graphene-NaNbO3 的合成与表征

IF 4.6 2区 物理与天体物理 Q1 OPTICS Optics and Laser Technology Pub Date : 2024-09-20 DOI:10.1016/j.optlastec.2024.111798
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引用次数: 0

摘要

我们首次尝试利用传统溶液法合成了铁铋-石墨烯-铌酸钠(BiFeO3-石墨烯-NaNbO3)三元纳米复合材料。发现石墨烯在 BiFeO3-NaNbO3 异质复合材料上负载浓度的系统性增加会影响其结构参数、光学性能、光催化染料降解及其介电性能,并通过粉末 X 射线衍射 (XRD) 对其进行了评估、通过粉末 X 射线衍射 (XRD)、拉曼光谱测量、扫描电子显微镜 (SEM)、能量色散 X 射线 (EDX)、紫外-可见-近红外区域的光学吸收光谱、光致发光 (PL) 研究、光催化和介电分析对它们进行了评估。因此,将 0.025% 浓度的石墨烯与 BiFeO3-NaNbO3 复合粉末混合,能够在 120 分钟内降解亚甲基蓝(MB)染料,最高效率可达 92%。引人注目的是,在石墨烯浓度为 0.025% 的相同条件下,合成的三元复合材料样品的介电常数增加了 37′。由此可以预测,介电行为与光催化染料降解特性之间存在密切的平行关系。此外,在石墨烯与 BiFeO3-NaNbO3 的各种负载浓度中,发现 0.025% 的较低石墨烯浓度是 BiFeO3-Graphene-NaNbO3 三元复合材料改善 MB 染料降解特性的最佳浓度,同时还能增强载流子重组抑制。此外,还详细讨论了其他有趣的结果。
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Synthesis and characterization of a heterogeneous ternary nanocomposite photocatalyst BiFeO3-Graphene-NaNbO3 for the degradation of MB dye disrupting pulmonary organs

A maiden attempt to synthesize ternary nanocomposites of Bismuth Ferrite-Graphene-Sodium Niobate (BiFeO3-Graphene-NaNbO3) has been made by utilizing conventional solution method. Systematic increase in the loading concentrations of graphene on BiFeO3-NaNbO3 heterogeneous composites found to have influenced their structural parameters, optical properties, photocatalytic dye degradation and their dielectric properties and they were assessed from powder X-ray diffraction (XRD), Raman spectral measurements, Scanning Electron Microscopy (SEM), Energy Dispersive X-ray (EDX), optical absorption spectra in UV–Visible-Near IR region, Photoluminescence (PL) studies, photocatalysis and dielectric analyses. As such, admixture of graphene concentration of 0.025 percent with BiFeO3-NaNbO3 composite powders capable of degrading the methylene blue (MB) dye upto a maximum efficiency of 92% within the time frame of 120 min. Strikingly, at the same graphene concentration of 0.025 percent, the synthesized ternary composite sample exhibits an increased dielectric constant value of ‘37′. A close parallelism between the dielectric behaviour and photocatalytic dye degradation properties could be predicted from this study. Further, among various loading concentrations of graphene with BiFeO3-NaNbO3, lower concentration of 0.025 percent of graphene has been found as the optimum one for the improved MB dye degradation characteristics of the ternary composites of BiFeO3-Graphene-NaNbO3 with enhanced suppression of carrier recombination. The other interesting results have been discussed in detail.

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来源期刊
CiteScore
8.50
自引率
10.00%
发文量
1060
审稿时长
3.4 months
期刊介绍: Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication. The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas: •development in all types of lasers •developments in optoelectronic devices and photonics •developments in new photonics and optical concepts •developments in conventional optics, optical instruments and components •techniques of optical metrology, including interferometry and optical fibre sensors •LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow •applications of lasers to materials processing, optical NDT display (including holography) and optical communication •research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume) •developments in optical computing and optical information processing •developments in new optical materials •developments in new optical characterization methods and techniques •developments in quantum optics •developments in light assisted micro and nanofabrication methods and techniques •developments in nanophotonics and biophotonics •developments in imaging processing and systems
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