用于 5G 应用的紧密间隔双波段极化不敏感 FSS

IF 3.1 3区 物理与天体物理 Q2 Engineering Optik Pub Date : 2024-09-16 DOI:10.1016/j.ijleo.2024.172040
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引用次数: 0

摘要

本研究为第五代(5G)应用提出了一种新型单层频率选择表面(FSS),它具有偏振无关的紧密间隔双频响应。所提出的设计包括在 RT5880 介质衬底上印刷的方形贴片上蚀刻四个分割环形孔。FSS 在 24.78 GHz 和 28 GHz 中心频率上有两个阻带,衰减量约为 55 dB。这些频带的 S21<-10 dB 带宽 (BW) 分别为 14.48 % 和 9.25 %,这些紧密间隔的频带成功地实现了 1.13 的频率比。对于 TE 和 TM 极化,它都显示出稳定的频率响应。此外,FSS 是一种单层、相当薄(厚度为 0.042λl)的结构,其单元尺寸为 0.70λl × 0.70λl,其中 λl 为低频时的自由空间波长。这种 FSS 的新颖之处不仅在于在毫米波频段实现了较小的紧密间隔频带比并表现出极化不敏感性,而且还以简单的几何形状和不复杂的单层结构提供了这些特性。仿真结果得到了测量结果的证实。所有这些结果使所介绍的 FSS 成为 5G 电磁干扰(EMI)屏蔽应用的理想候选器件。
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A closely spaced dual band polarization insensitive FSS for 5G applications
This study presents a novel single layer Frequency Selective Surface (FSS) for fifth generation (5G) applications with a polarization independent closely spaced dual band response. The proposed design consists of four split ring apertures etched on a square patch printed on a RT5880 dielectric substrate. The FSS has two stop-bands at 24.78 GHz and 28 GHz center frequencies with attenuations around 55 dB. The S21<−10 dB bandwidths (BW) of these bands are 14.48 % and 9.25 %, respectively and these closely spaced bands succeed 1.13 frequency ratio. It shows a stable frequency response for both TE and TM polarizations. Furthermore, the FSS represents a single layered and quite thin (thickness 0.042λl) structure with its unit cell size (0.70λl × 0.70λl, where λl is the free-space wavelength at lower frequency). The novelty of the presented FSS is not only achieving a small closely spaced band ratio in the mmWave band and exhibiting polarization insensitivity but also providing these features with a simple geometry and, uncomplicated single layer structure. The simulation results were confirmed by well accordant measurement results. All these results make the presented FSS a good candidate for 5G electromagnetic interference (EMI) shielding applications.
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来源期刊
Optik
Optik 物理-光学
CiteScore
6.90
自引率
12.90%
发文量
1471
审稿时长
46 days
期刊介绍: Optik publishes articles on all subjects related to light and electron optics and offers a survey on the state of research and technical development within the following fields: Optics: -Optics design, geometrical and beam optics, wave optics- Optical and micro-optical components, diffractive optics, devices and systems- Photoelectric and optoelectronic devices- Optical properties of materials, nonlinear optics, wave propagation and transmission in homogeneous and inhomogeneous materials- Information optics, image formation and processing, holographic techniques, microscopes and spectrometer techniques, and image analysis- Optical testing and measuring techniques- Optical communication and computing- Physiological optics- As well as other related topics.
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