纳米压印光栅制造技术研究

IF 6.1 1区 工程技术 Q1 ENGINEERING, MANUFACTURING Journal of Manufacturing Processes Pub Date : 2024-09-25 DOI:10.1016/j.jmapro.2024.09.033
Jiawei Zhang , Jirigalantu , Shuo Yu , Yilong Wang , Hongzhu Yu , Wenhao Li
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引用次数: 0

摘要

20 世纪 90 年代,普林斯顿大学的 Stephen Chou 教授提出了纳米压印光刻技术的概念,这是一种利用模板制造纳米结构的新方法。光栅复制就是利用这些加工过的光栅作为模具来制造复制品。然而,传统的光栅复制方法既复杂又低效。通过将快速纳米压印技术融入光栅复制,可以显著提高生产效率,这对大规模光栅复制至关重要。本文回顾了纳米压印技术在光栅制备方面的国内外最新进展。文章总结了纳米压印技术的发展过程,指出了利用纳米压印技术复制光栅所面临的挑战,并预测了高精度光栅复制的未来发展趋势。
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Research on manufacturing technology of nanoimprinted grating
In the 1990s, Professor Stephen Chou from Princeton University introduced the concept of nanoimprint lithography, a novel method for manufacturing nanostructures using templates. Grating replication involves using these processed gratings as molds to create replicas. However, traditional grating replication methods are complex and inefficient. By incorporating fast nanoimprinting technology into grating replication, production efficiency can be significantly improved, which is crucial for large-scale grating replication. This article reviews the recent advancements in nanoimprinting for grating preparation both domestically and internationally. It summarizes the development process, identifies the challenges in grating replication technology using nanoimprinting, and anticipates future trends in high-precision grating replication.
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来源期刊
Journal of Manufacturing Processes
Journal of Manufacturing Processes ENGINEERING, MANUFACTURING-
CiteScore
10.20
自引率
11.30%
发文量
833
审稿时长
50 days
期刊介绍: The aim of the Journal of Manufacturing Processes (JMP) is to exchange current and future directions of manufacturing processes research, development and implementation, and to publish archival scholarly literature with a view to advancing state-of-the-art manufacturing processes and encouraging innovation for developing new and efficient processes. The journal will also publish from other research communities for rapid communication of innovative new concepts. Special-topic issues on emerging technologies and invited papers will also be published.
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