二苯砜对二氧化锡 ETL 的调节,使基于 MAPbI3 的高效 PSC 在开放空气中的发光率超过 21.2

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2024-09-22 DOI:10.1016/j.surfin.2024.105155
Jinhuan Jiang, Chenyang Shi, Lixin Song, Pinfan Du, Wen Guo, Jie Xiong
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引用次数: 0

摘要

过氧化物层底部和二氧化锡 ETL 层的高密度缺陷导致的非辐射性重组不利于电荷转移。在这项工作中,将二苯基砜-4,4′-二氯-3,3′-二磺酸钠(SDCDPS)引入二氧化锡溶液,制备出了高质量的无针孔二氧化锡薄膜。SDCDPS 的磺酸盐与二苯砜协同钝化 SnO2 ETL 中未配位的 Sn4+,从而降低 SnO2 的功函数(WF),增加 SnO2 薄膜的传导性,减少预埋界面的电荷重组。此外,磺酸盐基团和二苯砜基团还能钝化包晶石中未配位的 Pb2+,从而提高包晶石的结晶度,减少非辐射重组。经过 SDCDPS 修饰后,透辉石太阳能电池的功率转换效率从 18.2% 显著提高到 21.2%,滞后因子从 10.4% 降低到 3.35%。同时,由于包晶石结晶度的提高和缺陷的减少,改性后的器件具有良好的稳定性。在相对湿度为 60% 的条件下,经过 SDCDPS 修饰的未封装器件的 PCE 在 720 小时后仍保持在初始器件的 81%。这项工作提供了一种可靠的方法来提高 PSC 中埋入界面的质量,并实现器件的高产和一致性。
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Regulation of SnO2 ETL by Diphenylsulfone for highly efficient MAPbI3 based PSCs over 21.2% in open Air
Non-radiative recombination due to high-density defects at the bottom of the perovskite layer and in the SnO2 ETL layer is not favourable for charge transfer. In this work, disodium diphenylsulfone-4,4′-dichloro-3,3′-disulfonate (SDCDPS) was introduced into SnO2 solution to prepare a high-quality pinhole-free SnO2 film. The sulfonate of SDCDPS collaborates with diphenylsulfone to passivate uncoordinated Sn4+ in SnO2 ETL, which will reduce the work function (WF) in the SnO2, increasing the conduction of SnO2 film and reducing the charge recombination of pre-buried interface. Besides, the sulfonate and diphenysulfone groups also passivate the uncoordinated Pb2+ in perovskite to increase the crystallinity of perovskite and reduce non-radiative recombination. After SDCDPS modification, the power conversion efficiency of perovskite solar cells significantly increased from 18.2% to 21.2% with hysteresis factor decreasing from 10.4% to 3.35%. Also, the modified device shows well stability due to the enhancement of perovskite crystallization and the reducing defects. Under relative humidity of ∼60%, the PCE of the unencapsulated device modified by SDCDPS remains at 81% of the initial device after 720h. This work offers a dependable method for enhancing the quality of the buried interface in PSC and to pursue productive and consistent devices.
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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