用于容噪高精度图像识别的 SrFeO3-δ/Nb:SrTiO3 外延异质结中的氧空位补偿诱导模拟电阻开关

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2024-09-27 DOI:10.1021/acsami.4c07951
Rui Su, Dunbao Chen, Weiming Cheng, Ruizi Xiao, Yuheng Deng, Yufeng Duan, Yi Li, Lei Ye, Hongyu An, Jingping Xu, Peter To Lai, Xiangshui Miao
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引用次数: 0

摘要

神经形态计算的灵感来自大脑架构,有望超越冯-诺依曼计算的局限性。在这一模式中,突触设备起着至关重要的作用,其中电阻开关存储器(忆阻器)因其低功耗和可扩展性优势而成为有前途的候选器件。本研究的重点是金属/氧化物-半导体异质结的开发,这种异质结具有多项技术优势,在人工神经突触中具有广泛的应用潜力。然而,在金属和氧化物半导体之间构建高质量的外延界面以及设计可修改的接触壁垒是一项挑战。在此,我们基于包晶相 SrFeO3-δ (PV-SFO)的金属性和与掺铌 SrTiO3 (NSTO)接触的小肖特基势垒,构建了高质量的金属/半导体外延界面。X 射线衍射图样、倒易空间映射结果和横截面透射电子显微镜图像显示,制备的 PV-SFO 薄膜具有完美的单晶结构,并且与 NSTO (111) 衬底之间具有良好的外延界面。相应的忆阻器表现出模拟型电阻可变特性,导通/关断比为 1000∼1000,10,000 秒后数据保持稳定,10,000 次脉冲循环后电阻无明显波动。电子能量损失光谱、第一原理计算和电学测量结果表明,补偿或恢复 NSTO 表面的氧空位会分别降低或增加 PV-SFO 与 NSTO 之间的接触势垒,从而逐渐调节电阻值。此外,高质量的外延 PV-SFO/NSTO 器件利用基于 LeNet-5 的网络结构实现了高达 98.21% 的手写识别准确率,利用视觉几何组(VGG)网络结构实现了高达 92.21% 的彩色图像识别准确率。这项工作有助于推动接口型忆阻器的发展,并为增强神经形态计算系统的突触功能提供了宝贵的见解。
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Oxygen Vacancy Compensation-Induced Analog Resistive Switching in the SrFeO3−δ/Nb:SrTiO3 Epitaxial Heterojunction for Noise-Tolerant High-Precision Image Recognition
Neuromorphic computing, inspired by the brain’s architecture, promises to surpass the limitations of von Neumann computing. In this paradigm, synaptic devices play a crucial role, with resistive switching memory (memristors) emerging as promising candidates due to their low power consumption and scalability advantages. This study focuses on the development of metal/oxide-semiconductor heterojunctions, which offer several technological advantages and have broad potential for applications in artificial neural synapses. However, constructing high-quality epitaxial interfaces between metal and oxide semiconductors and designing modifiable contact barriers are challenging. Herein, we construct high-quality epitaxial metal/semiconductor interfaces based on the metallicity of the perovskite phase SrFeO3−δ (PV-SFO) and a small Schottky barrier in contact with Nb-doped SrTiO3 (NSTO). X-ray diffraction patterns, reciprocal space mapping results, and cross-sectional transmission electron microscopy images reveal that the prepared PV-SFO film exhibits a perfect single-crystal structure and an excellent epitaxial interface with the NSTO (111) substrate. The corresponding memristor exhibits analog-type resistive-variable characteristics with an ON/OFF ratio of ∼1000, stable data retention after 10,000 s, and no noticeable fluctuation in resistance after 10,000 pulse cycles. Electron energy loss spectroscopy, first-principles calculations, and electrical measurements reveal that compensating or restoring oxygen vacancies at the NSTO surface decreases or increases the contact barrier between PV-SFO and NSTO, respectively, thereby gradually regulating the resistance value. Furthermore, high-quality epitaxial PV-SFO/NSTO devices achieve up to 98.21% recognition accuracy for handwriting recognition tasks using LeNet-5-based network structures and 92.21% accuracy for color images using visual geometry group (VGG) network structures. This work contributes to the advancement of interface-type memristors and provides valuable insights into enhancing synaptic functionality in neuromorphic computing systems.
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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