Shang Gao (高 尚) , María del Mar Sánchez-López , Ignacio Moreno
{"title":"奈奎斯特极限空间光调制器中显示的衍射光栅分析:三重光栅的应用","authors":"Shang Gao (高 尚) , María del Mar Sánchez-López , Ignacio Moreno","doi":"10.1016/j.optlaseng.2024.108628","DOIUrl":null,"url":null,"abstract":"<div><div>In this work we analyze diffraction gratings displayed on a pixelated spatial light modulator (SLM) at its spatial resolution limit (Nyquist limit) i.e., with largest diffraction angle, where the binary phase profile is the only alternative. Their implementation is influenced by the effect of a <span><math><mtext>sinc</mtext></math></span> envelope and the multiple replicas of the diffraction pattern that arise from the SLM pixelation, where the fill factor plays an essential role. We use the Fourier transform theory to analyze the binary phase grating in a pixelated device in terms of the pixel size, fill factor and phase difference between the two levels in the grating. This convolutional approach probes very useful to gain physical insight of the different contributions to the diffraction orders, and analytical expressions for the complex amplitude coefficients and intensities are obtained. Experimental verification is provided by encoding binary phase triplicator gratings with different periods on a high-resolution liquid-crystal on silicon SLM. The effect of the device pixelation and pixel crosstalk on the diffraction efficiency and on the conditions to obtain a Nyquist triplicator phase grating are studied. These results can be interesting for applications requiring programmable and large beam steering angles.</div></div>","PeriodicalId":49719,"journal":{"name":"Optics and Lasers in Engineering","volume":"184 ","pages":"Article 108628"},"PeriodicalIF":3.5000,"publicationDate":"2024-10-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Analysis of diffraction gratings displayed in spatial light modulators at the Nyquist limit: Application to the triplicator grating\",\"authors\":\"Shang Gao (高 尚) , María del Mar Sánchez-López , Ignacio Moreno\",\"doi\":\"10.1016/j.optlaseng.2024.108628\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>In this work we analyze diffraction gratings displayed on a pixelated spatial light modulator (SLM) at its spatial resolution limit (Nyquist limit) i.e., with largest diffraction angle, where the binary phase profile is the only alternative. Their implementation is influenced by the effect of a <span><math><mtext>sinc</mtext></math></span> envelope and the multiple replicas of the diffraction pattern that arise from the SLM pixelation, where the fill factor plays an essential role. We use the Fourier transform theory to analyze the binary phase grating in a pixelated device in terms of the pixel size, fill factor and phase difference between the two levels in the grating. This convolutional approach probes very useful to gain physical insight of the different contributions to the diffraction orders, and analytical expressions for the complex amplitude coefficients and intensities are obtained. Experimental verification is provided by encoding binary phase triplicator gratings with different periods on a high-resolution liquid-crystal on silicon SLM. The effect of the device pixelation and pixel crosstalk on the diffraction efficiency and on the conditions to obtain a Nyquist triplicator phase grating are studied. These results can be interesting for applications requiring programmable and large beam steering angles.</div></div>\",\"PeriodicalId\":49719,\"journal\":{\"name\":\"Optics and Lasers in Engineering\",\"volume\":\"184 \",\"pages\":\"Article 108628\"},\"PeriodicalIF\":3.5000,\"publicationDate\":\"2024-10-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optics and Lasers in Engineering\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0143816624006067\",\"RegionNum\":2,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"OPTICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optics and Lasers in Engineering","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0143816624006067","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"OPTICS","Score":null,"Total":0}
Analysis of diffraction gratings displayed in spatial light modulators at the Nyquist limit: Application to the triplicator grating
In this work we analyze diffraction gratings displayed on a pixelated spatial light modulator (SLM) at its spatial resolution limit (Nyquist limit) i.e., with largest diffraction angle, where the binary phase profile is the only alternative. Their implementation is influenced by the effect of a envelope and the multiple replicas of the diffraction pattern that arise from the SLM pixelation, where the fill factor plays an essential role. We use the Fourier transform theory to analyze the binary phase grating in a pixelated device in terms of the pixel size, fill factor and phase difference between the two levels in the grating. This convolutional approach probes very useful to gain physical insight of the different contributions to the diffraction orders, and analytical expressions for the complex amplitude coefficients and intensities are obtained. Experimental verification is provided by encoding binary phase triplicator gratings with different periods on a high-resolution liquid-crystal on silicon SLM. The effect of the device pixelation and pixel crosstalk on the diffraction efficiency and on the conditions to obtain a Nyquist triplicator phase grating are studied. These results can be interesting for applications requiring programmable and large beam steering angles.
期刊介绍:
Optics and Lasers in Engineering aims at providing an international forum for the interchange of information on the development of optical techniques and laser technology in engineering. Emphasis is placed on contributions targeted at the practical use of methods and devices, the development and enhancement of solutions and new theoretical concepts for experimental methods.
Optics and Lasers in Engineering reflects the main areas in which optical methods are being used and developed for an engineering environment. Manuscripts should offer clear evidence of novelty and significance. Papers focusing on parameter optimization or computational issues are not suitable. Similarly, papers focussed on an application rather than the optical method fall outside the journal''s scope. The scope of the journal is defined to include the following:
-Optical Metrology-
Optical Methods for 3D visualization and virtual engineering-
Optical Techniques for Microsystems-
Imaging, Microscopy and Adaptive Optics-
Computational Imaging-
Laser methods in manufacturing-
Integrated optical and photonic sensors-
Optics and Photonics in Life Science-
Hyperspectral and spectroscopic methods-
Infrared and Terahertz techniques