共蒸发掺杂剂的强晶界钝化效应增强了卤化铅包晶石的光辐射

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2024-10-22 DOI:10.1021/acsami.4c13434
Isabella A. Kalluvila Justin, David O. Tiede, Manuel Piot, Michele Forzatti, Cristina Roldán-Carmona, Juan F. Galisteo-López, Hernán Míguez, Henk J. Bolink
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引用次数: 0

摘要

在这里,我们证明了共蒸发掺杂剂是钝化蒸发的包晶体薄膜中发生在包晶体晶界处的埋藏界面缺陷的一种方法,从而产生增强的光致发光。通过广泛的光物理特性分析,我们提供的实验证据表明,偶联剂主要作用于晶界。它们钝化了界面陷阱,并阻止了光诱导深陷阱的形成。另一方面,过量有机掺杂剂的存在会导致载流子扩散障碍。因此,钝化过程需要适当平衡这两种效应。我们在不同的激发机制下对掺杂剂的作用进行了分析,从而能够在更适合光伏或发光应用的条件下评估材料的性能。在这种情况下,本文所采用的方法提供了一种筛选方法,可在将钝化策略应用于设备之前对其适用性进行评估。
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Strong Grain Boundary Passivation Effect of Coevaporated Dopants Enhances the Photoemission of Lead Halide Perovskites
Herein, we demonstrate that coevaporated dopants provide a means to passivate buried interfacial defects occurring at perovskite grain boundaries in evaporated perovskite thin films, thus giving rise to an enhanced photoluminescence. By means of an extensive photophysical characterization, we provide experimental evidence that indicate that the codopant acts mainly at the grain boundaries. They passivate interfacial traps and prevent the formation of photoinduced deep traps. On the other hand, the presence of an excessive amount of organic dopant can lead to a barrier for carrier diffusion. Hence, the passivation process demands a proper balance between the two effects. Our analysis on the role of the dopant, performed under different excitation regimes, permits evaluation of the performance of the material under conditions more adapted to photovoltaic or light emitting applications. In this context, the approach taken herein provides a screening method to evaluate the suitability of a passivating strategy prior to its incorporation into a device.
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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