利用 20-30 纳米区板研究结构对硬 X 射线聚焦和成像性能的影响。

IF 2.5 3区 物理与天体物理 Journal of Synchrotron Radiation Pub Date : 2024-11-01 Epub Date: 2024-10-28 DOI:10.1107/S1600577524009615
Xujie Tong, Vishal Dhamgaye, Qiucheng Chen, Qingxin Wu, Biao Deng, Ling Zhang, Oliver Fox, Hongchang Wang, Jun Zhao, Yifang Chen, Zijian Xu, Peng Li, Kawal Sawhney
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引用次数: 0

摘要

空间分辨率范围为 20-30 纳米的硬 X 射线显微镜是检测纳米级材料的先进工具。然而,聚焦光学元件(如菲涅尔区板(ZP)透镜)的有限效率会大大降低纳米探针的功率。尽管有多篇关于聚焦 20 纳米分辨率硬 X 射线的 ZP 透镜的报道(主要是通过区域加倍技术构建的),但有关限制因素的系统研究尚未见报道。我们采用改进的光束传播方法,报告了结构对 20-30 纳米分辨率 ZP 的聚焦和成像效率的影响。我们优化了区宽和占空比(区宽/环距),以实现最高效率,并对区材料进行了比较分析。优化后的区域结构被用于制造铂氢硅倍半氧烷(HSQ)ZPs。分辨率为 30 nm 的 Pt-HSQ-ZP 在 7 keV 时的最高聚焦效率为 10%,在 6-10 keV 范围内的最高聚焦效率大于 5%,而分辨率为 20 nm 的 Pt-HSQ-ZP 在 7 keV 时的最高效率为 7.6%。在 X 射线光束线进行的光学特性分析表明,在 5 keV 至 10 keV 的更宽硬 X 射线范围内,聚焦和成像效率都有显著提高,这证明了其在硬 X 射线聚焦和成像方面的应用潜力。
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A study of structural effects on the focusing and imaging performance of hard X-rays with 20-30 nm zone plates.

Hard X-ray microscopes with 20-30 nm spatial resolution ranges are an advanced tool for the inspection of materials at the nanoscale. However, the limited efficiency of the focusing optics, for example, a Fresnel zone plate (ZP) lens, can significantly reduce the power of a nanoprobe. Despite several reports on ZP lenses that focus hard X-rays with 20 nm resolution - mainly constructed by zone-doubling techniques - a systematic investigation into the limiting factors has not been reported. We report the structural effects on the focusing and imaging efficiency of 20-30 nm-resolution ZPs, employing a modified beam-propagation method. The zone width and the duty cycle (zone width/ring pitch) were optimized to achieve maximum efficiency, and a comparative analysis of the zone materials was conducted. The optimized zone structures were used in the fabrication of Pt-hydrogen silsesquioxane (HSQ) ZPs. The highest focusing efficiency of the Pt-HSQ-ZP with a resolution of 30 nm was 10% at 7 keV and >5% in the range 6-10 keV, whereas the highest efficiency of the Pt-HSQ-ZP with a resolution of 20 nm was realized at 7 keV with an efficiency of 7.6%. Optical characterization conducted at X-ray beamlines demonstrated significant enhancement of the focusing and imaging efficiency in a broader range of hard X-rays from 5 keV to 10 keV, demonstrating the potential application in hard X-ray focusing and imaging.

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来源期刊
Journal of Synchrotron Radiation
Journal of Synchrotron Radiation INSTRUMENTS & INSTRUMENTATIONOPTICS&-OPTICS
CiteScore
5.60
自引率
12.00%
发文量
289
审稿时长
1 months
期刊介绍: Synchrotron radiation research is rapidly expanding with many new sources of radiation being created globally. Synchrotron radiation plays a leading role in pure science and in emerging technologies. The Journal of Synchrotron Radiation provides comprehensive coverage of the entire field of synchrotron radiation and free-electron laser research including instrumentation, theory, computing and scientific applications in areas such as biology, nanoscience and materials science. Rapid publication ensures an up-to-date information resource for scientists and engineers in the field.
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