点缺陷和锂掺杂对单层氮化镓电子结构和光伏性能的第一性原理研究

IF 2.7 Q2 PHYSICS, CONDENSED MATTER Micro and Nanostructures Pub Date : 2024-10-23 DOI:10.1016/j.micrna.2024.208000
Jinji Si , Qingyu Hou , Weiya Li , Yi Liu , Riguleng Si
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引用次数: 0

摘要

通过化学气相沉积法制备单层氮化镓不可避免地会产生 H 间隙。本研究采用第一原理方法研究了单层 Ga36N36、Ga34LiN36 和 Ga34HiLiN36 (0 0 1) 表面的光学特性。在掺入 Li 和 H 间质的情况下,Ga36N36 的介电常数和反射率在低能量范围内发生了红移,介电常数和反射率得到了改善。在吸收光谱的可见光范围内,含杂质的表面发生了红移,Ga36N36 的光吸收得到了改善。Ga34HiLiN36 (0 0 1) 表面作为光电材料的性能优于其他表面。
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First principles study of point defects and Li doping on the electronic structure and photovoltaic performance of single-layer GaN
The preparation of single-layer GaN by chemical vapor deposition inevitably generates H interstitials. In this study, the optical properties of single-layer Ga36N36, Ga34LiN36 and Ga34HiLiN36 (0 0 1) surfaces were investigated by using the first-principles method. In the presence of Li doping and H interstitial, the dielectric function and reflectivity red-shifted in the low-energy range and the dielectric function and reflectivity of the Ga36N36 improved. In the visible range of the absorption spectrum, the impurity-containing surfaces red-shifted, and the light absorption on the Ga36N36 improved. The Ga34HiLiN36 (0 0 1) surface performed better as a photovoltaic material than other surfaces.
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