{"title":"电纺含氟聚合物 PVDF-HFP 厚膜的介电和储能性能明显改善：热压的影响","authors":"Sudhanshu Dhumrash , Anamol Gautam , Ajeet Kumar , Nitin Jaglan , Poonam Uniyal","doi":"10.1016/j.est.2024.114337","DOIUrl":null,"url":null,"abstract":"<div><div>Prospects of applicability of electrospun Poly(vinylidene fluoride-<em>co</em>-hexafluoropropylene) (PVDF-HFP) films for high energy density capacitors operable under harsh conditions (30 °C - 80 °C) has been investigated. The dielectric and energy storage behavior of structurally and morphologically characterized electrospun hot-pressed PVDF-HFP film has been thoroughly studied and analyzed in the temperature range of 30 °C - 80 °C. The pristine film, film hot-pressed at 110 °C and 150 °C are nominated as H-0, H-110 and H-150. The dielectric constant (ε) and dielectric loss (tanδ) of H-150 film at 1 kHz is found to be ∼13.4 and ∼ 0.04 respectively; whereas the respective values for H-110 films are ∼9.8 and ∼ 0.08. The dielectric properties of H-150 film are relatively more thermally stable as compared to H-110 film up to 80 °C. Discharge energy density, energy efficiency and breakdown strength for H-150 film are 3.7 J/cm<sup>3</sup>, 56 % and 1189 kV/cm respectively, which is remarkably higher as compared to H-0 with respective values as 0.128 J/cm<sup>3</sup>, 20 % and 352 kV/cm and H-110 film with respective values as 0.598 J/cm<sup>3</sup>, 42 % and 771 kV/cm. The superior dielectric properties, breakdown strength and energy storage behavior of PVDF-HFP film hot-pressed at 150 °C is attributed to the formation of a micro capacitive network caused by interfacial connectivity and alignment of the nanofibers. Hot-pressing of nanofiber polymeric films is a simple yet effective technique that could be a futuristic approach to develop dielectric films for high energy density capacitors.</div></div>","PeriodicalId":8,"journal":{"name":"ACS Biomaterials Science & Engineering","volume":null,"pages":null},"PeriodicalIF":5.4000,"publicationDate":"2024-10-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Appreciable amelioration in the dielectric and energy storage behavior of the electrospun fluoropolymer PVDF-HFP thick films: Effect of hot-pressing\",\"authors\":\"Sudhanshu Dhumrash , Anamol Gautam , Ajeet Kumar , Nitin Jaglan , Poonam Uniyal\",\"doi\":\"10.1016/j.est.2024.114337\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Prospects of applicability of electrospun Poly(vinylidene fluoride-<em>co</em>-hexafluoropropylene) (PVDF-HFP) films for high energy density capacitors operable under harsh conditions (30 °C - 80 °C) has been investigated. The dielectric and energy storage behavior of structurally and morphologically characterized electrospun hot-pressed PVDF-HFP film has been thoroughly studied and analyzed in the temperature range of 30 °C - 80 °C. The pristine film, film hot-pressed at 110 °C and 150 °C are nominated as H-0, H-110 and H-150. The dielectric constant (ε) and dielectric loss (tanδ) of H-150 film at 1 kHz is found to be ∼13.4 and ∼ 0.04 respectively; whereas the respective values for H-110 films are ∼9.8 and ∼ 0.08. The dielectric properties of H-150 film are relatively more thermally stable as compared to H-110 film up to 80 °C. Discharge energy density, energy efficiency and breakdown strength for H-150 film are 3.7 J/cm<sup>3</sup>, 56 % and 1189 kV/cm respectively, which is remarkably higher as compared to H-0 with respective values as 0.128 J/cm<sup>3</sup>, 20 % and 352 kV/cm and H-110 film with respective values as 0.598 J/cm<sup>3</sup>, 42 % and 771 kV/cm. The superior dielectric properties, breakdown strength and energy storage behavior of PVDF-HFP film hot-pressed at 150 °C is attributed to the formation of a micro capacitive network caused by interfacial connectivity and alignment of the nanofibers. Hot-pressing of nanofiber polymeric films is a simple yet effective technique that could be a futuristic approach to develop dielectric films for high energy density capacitors.</div></div>\",\"PeriodicalId\":8,\"journal\":{\"name\":\"ACS Biomaterials Science & Engineering\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":5.4000,\"publicationDate\":\"2024-10-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ACS Biomaterials Science & Engineering\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S2352152X24039239\",\"RegionNum\":2,\"RegionCategory\":\"医学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, BIOMATERIALS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Biomaterials Science & Engineering","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2352152X24039239","RegionNum":2,"RegionCategory":"医学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, BIOMATERIALS","Score":null,"Total":0}
Appreciable amelioration in the dielectric and energy storage behavior of the electrospun fluoropolymer PVDF-HFP thick films: Effect of hot-pressing
Prospects of applicability of electrospun Poly(vinylidene fluoride-co-hexafluoropropylene) (PVDF-HFP) films for high energy density capacitors operable under harsh conditions (30 °C - 80 °C) has been investigated. The dielectric and energy storage behavior of structurally and morphologically characterized electrospun hot-pressed PVDF-HFP film has been thoroughly studied and analyzed in the temperature range of 30 °C - 80 °C. The pristine film, film hot-pressed at 110 °C and 150 °C are nominated as H-0, H-110 and H-150. The dielectric constant (ε) and dielectric loss (tanδ) of H-150 film at 1 kHz is found to be ∼13.4 and ∼ 0.04 respectively; whereas the respective values for H-110 films are ∼9.8 and ∼ 0.08. The dielectric properties of H-150 film are relatively more thermally stable as compared to H-110 film up to 80 °C. Discharge energy density, energy efficiency and breakdown strength for H-150 film are 3.7 J/cm3, 56 % and 1189 kV/cm respectively, which is remarkably higher as compared to H-0 with respective values as 0.128 J/cm3, 20 % and 352 kV/cm and H-110 film with respective values as 0.598 J/cm3, 42 % and 771 kV/cm. The superior dielectric properties, breakdown strength and energy storage behavior of PVDF-HFP film hot-pressed at 150 °C is attributed to the formation of a micro capacitive network caused by interfacial connectivity and alignment of the nanofibers. Hot-pressing of nanofiber polymeric films is a simple yet effective technique that could be a futuristic approach to develop dielectric films for high energy density capacitors.
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