通过缺陷工程加速 Ni1-xO/Ni(OH)2/NF 的反应动力学,实现脲辅助水分离

IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC ACS Applied Electronic Materials Pub Date : 2024-11-01 DOI:10.1039/d4dt02871f
Yuan Rui, Zong Li, Miaohui Wang, Yunxia Liu, Haiping Lin, Peipei Huang, Qing Li
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引用次数: 0

摘要

在通过尿素辅助水分离实现可持续制氢的领域中,开发具有快速反应动力学的尿素氧化反应(UOR)电催化剂仍然具有挑战性。在这里,通过掺杂锌和酸蚀刻相结合的缺陷工程策略,制备了支撑在泡沫镍上(Ni1-xO/Ni(OH)2/NF)的 Ni1-xO/Ni(OH)2。在酸蚀刻过程中,掺杂的 Zn 物种被部分去除,促进了 NiOOOH 的形成。残留的 Zn 物质调节了镍位点的电子结构,从本质上加速了 Ni1-xO/Ni(OH)2/NF 的反应动力学。Ni1-xO/Ni(OH)2/NF 在 UOR 方面表现出色,与可逆氢电极相比,其电位低至 1.346 V,可达到 100 mA cm-2,反应动力学速度快(18.7 mV dec-1),在碱性电解质中具有极佳的稳定性。操作电化学阻抗谱和原位拉曼光谱研究清楚地阐明了 Ni1-xO/Ni(OH)2/NF 的增强反应动力学。我们的研究为尿素辅助水分离的实际应用提供了一种有效的方法来设计有前景的镍基 UOR 催化剂。
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Accelerating the reaction kinetics of Ni1-xO/Ni(OH)2/NF by defect engineering for urea-assisted water splitting
Developing electrocatalysts with fast reaction kinetics for urea oxidation reaction (UOR) in the field of sustainable hydrogen production through urea-assisted water splitting remains challenging. Here, Ni1-xO/Ni(OH)2 supported on nickel foam (Ni1-xO/Ni(OH)2/NF) is prepared via a defect engineering strategy by combining Zn doping and acid etching. Doped Zn species are partially removed, facilitating the formation of NiOOH during the acid etching. Residual Zn species modulate the electronic structure of nickel sites, which intrinsically accelerate the reaction kinetics of Ni1-xO/Ni(OH)2/NF. Ni1-xO/Ni(OH)2/NF exhibits excellent performances for UOR with a low potential of 1.346 V versus reversible hydrogen electrode to attain 100 mA cm-2, fast reaction kinetics (18.7 mV dec-1), and excellent stability in the alkaline electrolyte. The enhanced reaction kinetics of Ni1-xO/Ni(OH)2/NF are clearly elucidated by operando electrochemical impedance spectroscopy and in-situ Raman spectra investigations. Our study offers an effective approach to design promising Ni-based UOR catalysts for the practical application of urea-assisted water splitting.
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CiteScore
7.20
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4.30%
发文量
567
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