通过控制硒偏析优化 Pr 掺杂 SrTiO3 薄膜中的载流子迁移率,实现光电应用

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2024-10-24 DOI:10.1016/j.surfin.2024.105331
Midhun Shah , Sanam P.K. Jamshina , P.P. Pradyumnan
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引用次数: 0

摘要

电子元件中使用的功能氧化物为未来的电子设备带来了巨大的发展前景。基于钛酸锶的薄膜由于不饱和键、尺寸限制、氧空位和点缺陷的产生而具有一些新的特征,这使它们在光电应用中具有吸引力。在这里,我们通过射频磁控溅射技术,在纯氩气环境中以不同的气体压力制备了掺镨钛酸锶薄膜,然后进行了热处理。通过 XRD 和拉曼光谱分析的结构参数与电传输特性相关联。通过 FESEM 和 AFM 分析观察到的 Stranski-Krastanov(SK)生长和阳离子偏析等有趣的形态特征得到了进一步研究,从而阐明了薄膜的传导机制。光学研究揭示了薄膜在可见光谱下的显著透明度。特定波长的光致发光研究则揭示了氧空位的参与。通过仔细控制退火条件和优化溅射参数,制备出了没有锶偏析的薄膜,其载流子迁移率最高,达到 33.9 cm2/V s。高迁移率增强了导电性,使薄膜适用于广泛的光电应用。
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Optimization of carrier mobility in Pr-doped SrTiO3 thin films through controlled Sr-segregation for optoelectronic applications
Functional oxides employed in electronic components hold significant promise for future electronic devices. Strontium titanate based thin films have several emergent features due to unsaturated bonds, dimension restriction, production of oxygen vacancies and point defects that make them attractive for optoelectronic applications. Here we prepared Pr-doped strontium titanate thin films via RF magnetron sputtering in a pure Argon environment at various gas pressures followed by heat treatment. The structural parameters, analyzed via XRD and Raman spectroscopy, were correlated with the electrical transport properties. Intriguing morphological features such as Stranski–Krastanov (SK) growth and cation segregation observed by FESEM and AFM analysis were further examined to elucidate the conduction mechanism in the films. The optical studies unveiled significant transparency in the visible spectrum. Photoluminescence emission studies at specific wavelengths shed light on the involvement of oxygen vacancies. By carefully controlling annealing conditions and optimizing sputtering parameters, thin films devoid of Sr segregation with highest reported carrier mobility of 33.9 cm2/V s were prepared. The high mobility leading to enhanced conductivity render the films suitable for a wide range of optoelectronic applications.
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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