Haoyang Pan, Yangyu Dong, Yudi Wang, Jie Li, Yajie Zhang, Song Gao, Yongfeng Wang, Shimin Hou
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引用次数: 0
摘要
随着硅基集成电路的不断缩小,其分子特性也变得越来越明显。然而,硅基分子结的结构-性能关系仍有待阐明。在此,我们采用阶梯 C 模型哈密顿与非平衡格林函数形式主义相结合的方法,直观地解释了骨架二面角对过甲基化低聚硅烷传输特性的影响。骨架二面角会调节量子干涉(QI),导致 Si4Me10 中费米能(EF)处的传输系数发生高达 6 个数量级的变化。由于分子传导轨道 (MCO) 之间的 QI 类型(建设性或破坏性)不变,因此 QI 贡献的相对大小至关重要。在以往的理论研究中,QI 的这一定量方面往往被忽视。较小的骨架二面角会导致在 EF 附近出现局部 MCO,而在距离 EF 较远的地方则会出现非局部 MCO。因此,靠近 EF 的 MCO 之间的建设性 QI 会被抑制,而其他 MCO 之间的破坏性 QI 则会增强。这一见解为利用 QI 实现超绝缘分子器件开辟了一条途径。
Conformational Control of σ-Interference Effects in the Conductance of Permethylated Oligosilanes
As silicon-based integrated circuits continue to shrink, their molecular characteristics become more pronounced. However, the structure–property relationship of silicon-based molecular junctions remains to be elucidated. Here, an intuitive explanation of the effects of backbone dihedral angles on transport properties in permethylated oligosilanes is presented employing the Ladder C model Hamiltonian combined with nonequilibrium Green’s function formalism. Backbone dihedral angles modulate quantum interference (QI), resulting in the change of the transmission coefficient at the Fermi energy (EF) by up to 6 orders of magnitude in Si4Me10. Because the types of QI (constructive or destructive) between molecular conductance orbitals (MCOs) are unchanged, the relative magnitudes of contributions from QI are critical. This quantitative aspect of QI is often neglected in previous theoretical studies. Small backbone dihedral angles lead to localized MCOs near EF and delocalized MCOs further away from EF. As a result, the constructive QI between the MCOs near EF is suppressed, while the destructive QI between other MCOs is enhanced. This insight opens an avenue to harness QI to realize ultrainsulating molecular devices.
期刊介绍:
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