利用气相色谱法分析高纯度四氟化碳中三氟化氮杂质的方法

IF 2.2 4区 化学 Q3 CHEMISTRY, MULTIDISCIPLINARY Journal of the Iranian Chemical Society Pub Date : 2024-11-10 DOI:10.1007/s13738-024-03134-3
Mengdan Wang, Zhenquan Han, Jianyue Li, Yinhai Zhou, Jinlong Wang
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引用次数: 0

摘要

介绍了一种配备火焰离子化检测器的气相色谱法分析高纯度四氟化碳(≥ 99.999%)中痕量三氟化氮杂质的方法。该仪器系统采用了一个 10 口阀和三根色谱柱,可以完全分离三氟化氮和四氟化碳。在最佳分析条件下,进样量为 1 mL 时,定量限估计为 16.62 ppb。此外,该方法只需一次进样即可完成,无需通过阀门开关排出部分主要成分--高纯度四氟化碳,更加准确简便。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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Method for analyzing nitrogen trifluoride impurities in high-purity carbon tetrafluoride by gas chromatography

A method for the analysis of trace nitrogen trifluoride impurities in high-purity carbon tetrafluoride (≥ 99.999%) by gas chromatography equipped with a flame ionization detector is described. A 10-port valve and three columns have been used in this instrument system, which can completely separate nitrogen trifluoride and carbon tetrafluoride. In the best analytical conditions, the quantification limit was estimated at 16.62 ppb for an injected sample volume of 1 mL. Furthermore, this method can be completed by one sample injection without the need to vent some of the main component-high-purity carbon tetrafluoride through the valve switch, which is more accurate and simple.

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来源期刊
CiteScore
4.40
自引率
8.30%
发文量
230
审稿时长
5.6 months
期刊介绍: JICS is an international journal covering general fields of chemistry. JICS welcomes high quality original papers in English dealing with experimental, theoretical and applied research related to all branches of chemistry. These include the fields of analytical, inorganic, organic and physical chemistry as well as the chemical biology area. Review articles discussing specific areas of chemistry of current chemical or biological importance are also published. JICS ensures visibility of your research results to a worldwide audience in science. You are kindly invited to submit your manuscript to the Editor-in-Chief or Regional Editor. All contributions in the form of original papers or short communications will be peer reviewed and published free of charge after acceptance.
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