The-Long Phan, Le Viet Cuong, Vu Dinh Lam, Ngoc Toan Dang
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引用次数: 0
摘要
本研究提出了一种生长氧化锌纳米结构的简单化学气相沉积(CVD)方法。通过在常压条件下对锌粉进行退火处理,我们收集到了各种形态的纳米晶体,包括棒状、铅笔状、片状、梳状、四棱柱状和多棱柱状。拉曼散射研究表明,这些样品为单相六方结构,属于 P63 mc 空间群。根据形态和晶体质量的不同,它们的光致发光光谱只有与激子辐射重组相关的强紫外发射,或同时具有紫外发射和与缺陷相关的可见发射,其相对强度比随激发功率密度而变化。研究结果证明,氧化锌具有许多新颖的纳米结构,可以促进下一代光电纳米器件的开发以及在生物和生物医学领域的新应用。
Various CVD-grown ZnO nanostructures for nanodevices and interdisciplinary applications.
This work presents a simple chemical vapour deposition (CVD) method to grow ZnO nanostructures. By annealing Zn powder under atmospheric pressure conditions, we collected nanocrystals with various morphologies, including rods, pencils, sheets, combs, tetrapods, and multilegs. Raman scattering study reveals that the samples are monophasic with a hexagonal structure, and fall into the P63mc space group. Depending on the morphology and crystal quality, their photoluminescence spectra have only a strong UV emission associated with the exciton radiative recombination, or both UV and defect-related visible emissions with their relative intensity ratio varying with the excitation power density. The obtained results prove that ZnO exhibits many novel nanostructures that can foster the development of next-generation optoelectronic nanodevices and new applications in biological and biomedical fields.
期刊介绍:
The Beilstein Journal of Nanotechnology is an international, peer-reviewed, Open Access journal. It provides a unique platform for rapid publication without any charges (free for author and reader) – Platinum Open Access. The content is freely accessible 365 days a year to any user worldwide. Articles are available online immediately upon publication and are publicly archived in all major repositories. In addition, it provides a platform for publishing thematic issues (theme-based collections of articles) on topical issues in nanoscience and nanotechnology.
The journal is published and completely funded by the Beilstein-Institut, a non-profit foundation located in Frankfurt am Main, Germany. The editor-in-chief is Professor Thomas Schimmel – Karlsruhe Institute of Technology. He is supported by more than 20 associate editors who are responsible for a particular subject area within the scope of the journal.