电子束蒸发钙和钇稳定氧化锆薄膜的相变和表面分析

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS Thin Solid Films Pub Date : 2024-11-15 DOI:10.1016/j.tsf.2024.140575
Ankit Kumar , Pravin Kumar , A S Dhaliwal
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引用次数: 0

摘要

该手稿研究了在硅晶片上通过电子束沉积合成的钙稳定氧化锆(CSZ,16 mol % CaO)薄膜的结构和形态特征,重点是 800 °C 退火过程中的相变。研究将这些特性与钇稳定氧化锆(YSZ,8 mol % Y2O3)薄膜进行了比较。卢瑟福背散射光谱法验证了薄膜的成分,CSZ 的厚度为 ∼315 nm,YSZ 的厚度为 ∼285 nm。X 射线衍射初步确定了无定形结构,退火后过渡到立方相,CSZ 和 YSZ 的平均结晶尺寸分别为 18.07 nm 和 16.22 nm,拉曼光谱也证实了这一点。晶格参数是通过里特维尔德精炼法确定的。通过场发射扫描电子显微镜和原子力显微镜对表面形貌进行了研究,结果表明退火后 CSZ 的表面粗糙度从 6.05 nm 降至 1.34 nm,YSZ 的表面粗糙度从 4.54 nm 降至 1.64 nm,这表明均匀性得到了增强。利用能量色散 X 射线光谱进行的元素分布分析证实了薄膜的均匀性。这项研究深入揭示了钙稳定氧化锆薄膜的结构演变和形态特征,尤其是在纳米级水平上,为其工业应用提供了宝贵的资料。
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Phase evolution and surface analysis of electron beam evaporated calcium and yttria-stabilized zirconia thin films
The manuscript investigates the structural and morphological characteristics of thin films of calcium stabilized zirconia (CSZ, 16 mol % CaO), synthesized through electron beam deposition on silicon wafers, with a focus on the phase evolution during annealing at 800 °C. The study compares these properties with yttria stabilized zirconia (YSZ, 8 mol % Y2O3) thin films. Rutherford backscattering spectrometry validates film composition, with thicknesses of ∼315 nm for CSZ and ∼285 nm for YSZ. X-ray diffraction initially identifies an amorphous structure, transitioning to a cubic phase post-annealing, with average crystallite sizes of 18.07 nm for CSZ and 16.22 nm for YSZ, corroborated by Raman spectroscopy. The lattice parameters are determined using Rietveld refinement. Surface morphology is investigated through field emission scanning electron microscope and atomic force microscopy shows a reduction in surface roughness from 6.05 nm to 1.34 nm for CSZ and from 4.54 nm to 1.64 nm for YSZ post-annealing, indicating enhanced homogeneity. Elemental distribution analysis using energy dispersive X-ray spectroscopy confirms film uniformity. The study provides insights into the structural evolution and morphological characteristics of calcium stabilized zirconia thin films, particularly at the nanoscale level, offering valuable contributions to its industrial applicability.
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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