Christopher Broyles, Sougata Mardanya, Mengke Liu, Junyeong Ahn, Thao Dinh, Gadeer Alqasseri, Jalen Garner, Zackary Rehfuss, Ken Guo, Jiahui Zhu, David Martinez, Du Li, Yiqing Hao, Huibo Cao, Matt Boswell, Weiwei Xie, Jeremy G. Philbrick, Tai Kong, Li Yang, Ashvin Vishwanath, Philip Kim, Su-Yang Xu, Jennifer E. Hoffman, Jonathan D. Denlinger, Sugata Chowdhury, Sheng Ran
{"title":"UOTe:范德华晶格中的近藤相互作用拓扑反铁磁体","authors":"Christopher Broyles, Sougata Mardanya, Mengke Liu, Junyeong Ahn, Thao Dinh, Gadeer Alqasseri, Jalen Garner, Zackary Rehfuss, Ken Guo, Jiahui Zhu, David Martinez, Du Li, Yiqing Hao, Huibo Cao, Matt Boswell, Weiwei Xie, Jeremy G. Philbrick, Tai Kong, Li Yang, Ashvin Vishwanath, Philip Kim, Su-Yang Xu, Jennifer E. Hoffman, Jonathan D. Denlinger, Sugata Chowdhury, Sheng Ran","doi":"10.1002/adma.202414966","DOIUrl":null,"url":null,"abstract":"Since the initial discovery of 2D van der Waals (vdW) materials, significant effort has been made to incorporate the three properties of magnetism, band structure topology, and strong electron correlations—to leverage emergent quantum phenomena and expand their potential applications. However, the discovery of a single vdW material that intrinsically hosts all three ingredients has remained an outstanding challenge. Here, the discovery of a Kondo-interacting topological antiferromagnet is reported in the vdW 5<i>f</i> electron system UOTe. It has a high antiferromagnetic (AFM) transition temperature of 150 K, with a unique AFM configuration that breaks the combined parity and time reversal (<i>PT</i>) symmetry in an even number of layers while maintaining zero net magnetic moment. This angle-resolved photoemission spectroscopy (ARPES) measurements reveal Dirac bands near the Fermi level, which combined with the theoretical calculations demonstrate UOTe as an AFM Dirac semimetal. Within the AFM order, the presence of the Kondo interaction is observed, as evidenced by the emergence of a 5<i>f</i> flat band near the Fermi level below 100 K and hybridization between the Kondo band and the Dirac band. The density functional theory calculations in its bilayer form predict UOTe as a rare example of a fully-compensated AFM Chern insulator.","PeriodicalId":114,"journal":{"name":"Advanced Materials","volume":"23 1","pages":""},"PeriodicalIF":27.4000,"publicationDate":"2024-11-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"UOTe: Kondo-Interacting Topological Antiferromagnet in a Van der Waals Lattice\",\"authors\":\"Christopher Broyles, Sougata Mardanya, Mengke Liu, Junyeong Ahn, Thao Dinh, Gadeer Alqasseri, Jalen Garner, Zackary Rehfuss, Ken Guo, Jiahui Zhu, David Martinez, Du Li, Yiqing Hao, Huibo Cao, Matt Boswell, Weiwei Xie, Jeremy G. Philbrick, Tai Kong, Li Yang, Ashvin Vishwanath, Philip Kim, Su-Yang Xu, Jennifer E. Hoffman, Jonathan D. Denlinger, Sugata Chowdhury, Sheng Ran\",\"doi\":\"10.1002/adma.202414966\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Since the initial discovery of 2D van der Waals (vdW) materials, significant effort has been made to incorporate the three properties of magnetism, band structure topology, and strong electron correlations—to leverage emergent quantum phenomena and expand their potential applications. However, the discovery of a single vdW material that intrinsically hosts all three ingredients has remained an outstanding challenge. Here, the discovery of a Kondo-interacting topological antiferromagnet is reported in the vdW 5<i>f</i> electron system UOTe. It has a high antiferromagnetic (AFM) transition temperature of 150 K, with a unique AFM configuration that breaks the combined parity and time reversal (<i>PT</i>) symmetry in an even number of layers while maintaining zero net magnetic moment. This angle-resolved photoemission spectroscopy (ARPES) measurements reveal Dirac bands near the Fermi level, which combined with the theoretical calculations demonstrate UOTe as an AFM Dirac semimetal. Within the AFM order, the presence of the Kondo interaction is observed, as evidenced by the emergence of a 5<i>f</i> flat band near the Fermi level below 100 K and hybridization between the Kondo band and the Dirac band. 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UOTe: Kondo-Interacting Topological Antiferromagnet in a Van der Waals Lattice
Since the initial discovery of 2D van der Waals (vdW) materials, significant effort has been made to incorporate the three properties of magnetism, band structure topology, and strong electron correlations—to leverage emergent quantum phenomena and expand their potential applications. However, the discovery of a single vdW material that intrinsically hosts all three ingredients has remained an outstanding challenge. Here, the discovery of a Kondo-interacting topological antiferromagnet is reported in the vdW 5f electron system UOTe. It has a high antiferromagnetic (AFM) transition temperature of 150 K, with a unique AFM configuration that breaks the combined parity and time reversal (PT) symmetry in an even number of layers while maintaining zero net magnetic moment. This angle-resolved photoemission spectroscopy (ARPES) measurements reveal Dirac bands near the Fermi level, which combined with the theoretical calculations demonstrate UOTe as an AFM Dirac semimetal. Within the AFM order, the presence of the Kondo interaction is observed, as evidenced by the emergence of a 5f flat band near the Fermi level below 100 K and hybridization between the Kondo band and the Dirac band. The density functional theory calculations in its bilayer form predict UOTe as a rare example of a fully-compensated AFM Chern insulator.
期刊介绍:
Advanced Materials, one of the world's most prestigious journals and the foundation of the Advanced portfolio, is the home of choice for best-in-class materials science for more than 30 years. Following this fast-growing and interdisciplinary field, we are considering and publishing the most important discoveries on any and all materials from materials scientists, chemists, physicists, engineers as well as health and life scientists and bringing you the latest results and trends in modern materials-related research every week.