用于系统级ESD保护的低压NIPIN对称和双向二极管

IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Electron Device Letters Pub Date : 2024-10-10 DOI:10.1109/LED.2024.3477747
Jayatika Sakhuja;Udayan Ganguly;Sandip Lashkare
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引用次数: 0

摘要

低电压(<1V)双向和对称静电放电(ESD)保护装置对于系统级ESD保护是必不可少的,例如用于MCU的低电压GPIO, Sub-20nm I/O,以及潜在的下一代接口USB3.2 Gen2, Thunderbolt 4。本文提出了一种三角形势垒设计的可变电压<0.5V至2V的硅NIPIN (n+ -i-p+ -i-n+)穿孔二极管,用于低压系统级ESD保护。NIPIN二极管利用亚带隙电压冲击电离实现超低电压击穿。通过TCAD仿真证明了通过控制本征区、掺p+区和掺p+区长度来控制击穿电压。最后,通过与其他低压保护器件的定电压和箝位电压的比较,证明了NIPIN保护器件的电压性能接近理想。这种低箝位电压的低电压ESD保护是低压电子技术的重要发展。
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Low Voltage NIPIN Symmetric and Bi-Directional Diode for System Level ESD Protection
Low voltage (<1V) bi-directional and symmetric electrostatic discharge (ESD) protection devices are essential for system level ESD protection of low voltage electronics such Low voltage GPIO for MCU, Sub-20nm I/O’s, and potentially for next gen interfaces USB3.2 Gen2, Thunderbolt 4. Here, a triangular barrier designed Silicon NIPIN (n+ -i-p+ -i-n+) punch-through diode with variable voltage <0.5V to 2V is proposed for low-voltage system level ESD protection. The NIPIN diode utilizes the sub-bandgap voltage impact ionization to enable the ultra-low voltage breakdown. The control over the breakdown voltage is demonstrated via TCAD simulations by controlling the lengths of intrinsic, and p+ -doped regions and the doping of p+ -doped region. Finally, standoff voltage and clamping voltages are compared with other low voltage protection devices and demonstrate near ideal voltage performance of the NIPIN protection device. Such a low voltage ESD protection with low clamping voltage is a critical development for low-voltage electronics.
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来源期刊
IEEE Electron Device Letters
IEEE Electron Device Letters 工程技术-工程:电子与电气
CiteScore
8.20
自引率
10.20%
发文量
551
审稿时长
1.4 months
期刊介绍: IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.
期刊最新文献
Front Cover Table of Contents IEEE Transactions on Electron Devices Table of Contents IEEE Electron Device Letters Information for Authors EDS Meetings Calendar
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