位置分辨原位同步加速器粉末x射线衍射揭示了振动磨机中与位置无关的产品增长率

IF 5.2 3区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY Journal of Applied Crystallography Pub Date : 2024-11-08 DOI:10.1107/S1600576724010057
Hidetaka Kasai, Eiji Nishibori
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引用次数: 0

摘要

利用原位同步加速器粉末x射线衍射研究了随x射线照射位置变化而引起的球磨机械化学反应的位置和时间依赖性。用x射线在两个不同的垂直位置入射,现场监测了AgCl与Cu的机械化学还原。我们先前开发的多距离Rietveld方法用于分析1分钟分辨率的原位衍射数据。垂直和水平的样品位置都是利用原位数据的样品到探测器的距离来确定的。铺粉时间和感应时间存在位置依赖性。我们发现,当以1分钟的时间分辨率测量时,产品的增加速率与样品位置无关,证实了在磨矿罐中对部分空间进行渐进机械化学反应的原位监测的有效性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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Position-independent product increase rate in a shaker mill revealed by position-resolved in situ synchrotron powder X-ray diffraction

We investigated the position and time dependence of a mechanochemical reaction induced by ball milling using in situ synchrotron powder X-ray diffraction with changing X-ray irradiation position. The mechanochemical reduction of AgCl with Cu was monitored in situ with the X-rays incident at two different vertical positions on the jar. Our previously developed multi-distance Rietveld method was applied to analyze the in situ diffraction data with a 1 min resolution. Both the vertical and the horizontal sample positions were determined using the sample-to-detector distances from the in situ data. Position dependence was found in the powder spreading and induction time. We reveal that the increase rate of the product is independent of the sample position when measured with a 1 min time resolution, confirming the validity of in situ monitoring of part of the space in a milling jar for a gradual mechanochemical reaction.

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来源期刊
Journal of Applied Crystallography
Journal of Applied Crystallography CHEMISTRY, MULTIDISCIPLINARYCRYSTALLOGRAPH-CRYSTALLOGRAPHY
CiteScore
7.80
自引率
3.30%
发文量
178
期刊介绍: Many research topics in condensed matter research, materials science and the life sciences make use of crystallographic methods to study crystalline and non-crystalline matter with neutrons, X-rays and electrons. Articles published in the Journal of Applied Crystallography focus on these methods and their use in identifying structural and diffusion-controlled phase transformations, structure-property relationships, structural changes of defects, interfaces and surfaces, etc. Developments of instrumentation and crystallographic apparatus, theory and interpretation, numerical analysis and other related subjects are also covered. The journal is the primary place where crystallographic computer program information is published.
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