新型中子远场干涉仪的小角散射和暗场成像验证

IF 5.2 3区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY Journal of Applied Crystallography Pub Date : 2024-11-08 DOI:10.1107/S1600576724009944
Caitlyn M. Wolf, Peter Bajcsy, Wei-Ren Chen, Robert M. Dalgliesh, M. Cyrus Daugherty, Liliana de Campo, Fumiaki Funama, Lilin He, Michael G Huber, David L. Jacobson, Paul Kienzle, Youngju Kim, Hubert King, Nikolai N. Klimov, Jacob M. LaManna, Fankang Li, Alexander M. Long, Ryan Murphy, Gergely Nagy, Sarah M. Robinson, Pushkar Sathe, Gregory N. Smith, Anna Sokolova, Sven C. Vogel, Erik B. Watkins, Yuxuan Zhang, Daniel S. Hussey, Katie M. Weigandt
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引用次数: 0

摘要

复杂材料的持续发展往往需要对许多长度尺度上的结构-功能关系有更深入的了解,当需要多次测量来表征分层和内在异质性材料时,这很快就成为一项艰巨的任务。因此,同时表征多个长度尺度是有好处的。在国家标准与技术研究所,一种新的中子远场干涉仪正在开发中,旨在结合小角度中子散射(SANS)和中子成像和层析成像的最佳效果,实现多尺度测量。通过暗场成像与常规衰减射线照相(>10µm)同时收集与SANS(0.001-1µm)和超小角中子散射(USANS, 0.1-10µm)相同长度尺度的空间分辨结构信息。暗场类似于自旋回波SANS (SESANS)测量的极化损耗,并通过汉克尔变换与各向同性SANS相关。因此,我们利用这种密切关系,分析了SANS、USANS、SESANS和单分散球体暗场成像的结果,作为干涉测量的验证指标。结果还突出了这些中子技术在稳态和脉冲中子源中的优缺点。最后,我们给出了一个由暗场成像实现的空间分辨率在研究更复杂的非均质材料中所增加的价值的例子。否则,在对样品进行的其他小角度散射测量中,这些信息就会丢失。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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Small-angle scattering and dark-field imaging for validation of a new neutron far-field interferometer

The continued advancement of complex materials often requires a deeper understanding of the structure–function relationship across many length scales, which quickly becomes an arduous task when multiple measurements are required to characterize hierarchical and inherently heterogeneous materials. Therefore, there are benefits in the simultaneous characterization of multiple length scales. At the National Institute of Standards and Technology, a new neutron far-field interferometer is under development that aims to enable a multi-scale measurement combining the best of small-angle neutron scattering (SANS) and neutron imaging and tomography. Spatially resolved structural information on the same length scales as SANS (0.001–1 µm) and ultra-small-angle neutron scattering (USANS, 0.1–10 µm) will be collected via dark-field imaging simultaneously with regular attenuation radiography (>10 µm). The dark field is analogous to the polarization loss measured in spin-echo SANS (SESANS) and is related to isotropic SANS through a Hankel transform. Therefore, we use this close relationship and analyze results from SANS, USANS, SESANS and dark-field imaging of monodisperse spheres as a validation metric for the interferometry measurements. The results also highlight the strengths and weaknesses of these neutron techniques for both steady-state and pulsed neutron sources. Finally, we present an example of the value added by the spatial resolution enabled by dark-field imaging in the study of more complex heterogeneous materials. This information would otherwise be lost in other small-angle scattering measurements averaged over the sample.

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来源期刊
Journal of Applied Crystallography
Journal of Applied Crystallography CHEMISTRY, MULTIDISCIPLINARYCRYSTALLOGRAPH-CRYSTALLOGRAPHY
CiteScore
7.80
自引率
3.30%
发文量
178
期刊介绍: Many research topics in condensed matter research, materials science and the life sciences make use of crystallographic methods to study crystalline and non-crystalline matter with neutrons, X-rays and electrons. Articles published in the Journal of Applied Crystallography focus on these methods and their use in identifying structural and diffusion-controlled phase transformations, structure-property relationships, structural changes of defects, interfaces and surfaces, etc. Developments of instrumentation and crystallographic apparatus, theory and interpretation, numerical analysis and other related subjects are also covered. The journal is the primary place where crystallographic computer program information is published.
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