Peter Salén, Anatoliy Opanasenko, Giovanni Perosa, Vitaliy Goryashko
{"title":"最先进的电子束用于超快科学的紧凑工具。","authors":"Peter Salén, Anatoliy Opanasenko, Giovanni Perosa, Vitaliy Goryashko","doi":"10.1016/j.ultramic.2024.114080","DOIUrl":null,"url":null,"abstract":"<p><p>We review state-of-the-art electron beams for single-shot megaelectronvolt ultrafast electron diffraction (MeV-UED) and compact light sources. Our primary focus is on sub-100 femtosecond electron bunches in the 2-30 MeV energy range. We demonstrate that our new and recent simulation results permit significantly improved bunch parameters for these applications.</p>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":"268 ","pages":"114080"},"PeriodicalIF":2.1000,"publicationDate":"2025-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"State-of-the-art electron beams for compact tools of ultrafast science.\",\"authors\":\"Peter Salén, Anatoliy Opanasenko, Giovanni Perosa, Vitaliy Goryashko\",\"doi\":\"10.1016/j.ultramic.2024.114080\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p><p>We review state-of-the-art electron beams for single-shot megaelectronvolt ultrafast electron diffraction (MeV-UED) and compact light sources. Our primary focus is on sub-100 femtosecond electron bunches in the 2-30 MeV energy range. We demonstrate that our new and recent simulation results permit significantly improved bunch parameters for these applications.</p>\",\"PeriodicalId\":23439,\"journal\":{\"name\":\"Ultramicroscopy\",\"volume\":\"268 \",\"pages\":\"114080\"},\"PeriodicalIF\":2.1000,\"publicationDate\":\"2025-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Ultramicroscopy\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://doi.org/10.1016/j.ultramic.2024.114080\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"2024/11/26 0:00:00\",\"PubModel\":\"Epub\",\"JCR\":\"Q2\",\"JCRName\":\"MICROSCOPY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ultramicroscopy","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1016/j.ultramic.2024.114080","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2024/11/26 0:00:00","PubModel":"Epub","JCR":"Q2","JCRName":"MICROSCOPY","Score":null,"Total":0}
State-of-the-art electron beams for compact tools of ultrafast science.
We review state-of-the-art electron beams for single-shot megaelectronvolt ultrafast electron diffraction (MeV-UED) and compact light sources. Our primary focus is on sub-100 femtosecond electron bunches in the 2-30 MeV energy range. We demonstrate that our new and recent simulation results permit significantly improved bunch parameters for these applications.
期刊介绍：
Ultramicroscopy is an established journal that provides a forum for the publication of original research papers, invited reviews and rapid communications. The scope of Ultramicroscopy is to describe advances in instrumentation, methods and theory related to all modes of microscopical imaging, diffraction and spectroscopy in the life and physical sciences.
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