基于过程的建模和基于TOPSIS方法的短路安全工作区(SCSOA)优化

IF 2.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Transactions on Electron Devices Pub Date : 2024-11-12 DOI:10.1109/TED.2024.3489603
Yifei Chang;Jiaxuan Wang;Hao Guan;Pan Liu
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引用次数: 0

摘要

电力电子广泛应用于新能源汽车、光伏等领域。其鲁棒性一直受到关注,其中短路鲁棒性是其重要组成部分,值得深入研究。本文主要研究了一种1200 v沟场停止(FS)绝缘栅双极晶体管(IGBT)的短路安全工作区域(SCSOA)性能。首先,建立了基于实际工艺流程的模型,并与扫描电镜(SEM)结果一致,将其静态和动态电特性的差异分别控制在5%和12%以内。随后,通过TCAD建模对被测设备(DUT)在短路条件下的两种主要失效模式和机理进行了识别和分析,并通过实际短路试验进行了验证。最后,应用多准则决策(MCDM)的TOPSIS方法对SCSOA进行优化,使器件的短路鲁棒性提高了4%,同时对其他电气性能的损失最小。
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1200-V Trench-FS IGBT: Process-Based Modeling and Short-Circuit Safe Operating Area (SCSOA) Optimization With the TOPSIS Method
Power electronics are widely used in new energy vehicles, photovoltaics, and other fields. Its robustness has been concerned, and short-circuit robustness is an essential part of it, which is worth in-depth research. In this work, a 1200-V Trench-field-stop (FS) insulated-gate bipolar transistor (IGBT) was focused on for its short-circuit safe operating area (SCSOA) capability analysis. First, a model based on the actual process flow was set up, aligned with the scanning electron microscope (SEM) results, with the discrepancy between its static and dynamic electrical characteristics controlled within 5% and 12%, respectively. Subsequently, two primary failure modes and mechanisms of the device under test (DUT) under short-circuit conditions were identified, analyzed through TCAD modeling, and verified through actual short-circuit tests. Finally, the Technique for Order of Preference by Similarity to Ideal Solution (TOPSIS) method for multiple-criteria decision-making (MCDM) was applied to optimize the SCSOA, enhancing the short-circuit robustness of the device by 4% with minimal loss to other electrical performances.
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来源期刊
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices 工程技术-工程:电子与电气
CiteScore
5.80
自引率
16.10%
发文量
937
审稿时长
3.8 months
期刊介绍: IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
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