伸缩纳米线的热整流:热边界电阻的影响

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2024-12-18 DOI:10.1021/acsami.4c14920
Yashpreet Kaur, Saeko Tachikawa, Milo Yaro Swinkels, Miquel López-Suárez, Matteo Camponovo, Alicia Ruiz Caridad, Wonjong Kim, Anna Fontcuberta i Morral, Riccardo Rurali, Ilaria Zardo
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引用次数: 0

摘要

热二极管是热电路的基本组成部分,与电二极管类似,它可以对热流进行整流。为了实现一个热二极管,我们用热桥方法演示了在砷化镓伸缩纳米线系统中的热整流。我们测量了热流的首选方向,作为应用热偏压的函数,实现了从2%到8%的整流值。研究表明,具有纤锌矿晶体相的纳米线的细部和具有锌-闪锌矿晶体相的厚部之间的热边界电阻对热流整流的量和方向起着至关重要的作用。基于从头算数据的一维热方程的数值解证实了这一效应。此外,我们考虑了热接触电阻的影响。这项工作是利用伸缩纳米线进行整流的第一个实验指示,我们揭示了热边界电阻在决定热整流中的重要性和作用。
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Thermal Rectification in Telescopic Nanowires: Impact of Thermal Boundary Resistance
A thermal diode, which, by analogy to its electrical counterpart, rectifies heat current, is the building block for thermal circuits. To realize a thermal diode, we demonstrate thermal rectification in a GaAs telescopic nanowire system using the thermal bridge method. We measured a preferred direction of heat flux, achieving rectification values ranging from 2 to 8% as a function of applied thermal bias. We demonstrate that the thermal boundary resistance between the thin part with the wurtzite crystal phase and the thick part with the zinc-blende crystal phase of the telescopic nanowire plays a crucial role in determining the amount and direction of heat flux rectification. This effect is confirmed by numerical solutions of the one-dimensional heat equation based on ab initio data. Additionally, we accounted for the effect of the thermal contact resistance. This work is the first experimental indication of rectification using a telescopic nanowire where we reveal the importance and role of the thermal boundary resistance in determining thermal rectification.
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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