利用最优控制降低忆阻开关的焦耳损耗

IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Transactions on Nanotechnology Pub Date : 2024-12-13 DOI:10.1109/TNANO.2024.3517161
Valeriy A. Slipko;Yuriy V. Pershin
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引用次数: 0

摘要

本理论研究探讨了最小化电阻随机存取存储器(ReRAM)单元焦耳损耗的策略,也被称为记忆器件。通常,ReRAM电池的结构包括一个纳米级的电阻开关材料层,夹在两个金属电极之间。我们要问的基本问题是什么是最优的驱动协议来切换记忆器件从一种状态到另一种。在理想忆阻器的情况下,在最基本的情况下,通过借助欧拉-拉格朗日方程求解无约束的变分问题来确定最优方案。对于记忆系统,在相同的情况下,使用拉格朗日乘子法找到了最优协议。我们通过具体的例子证明了我们的方法的优点,并将我们的结果与恒压或恒流开关的结果进行了比较。我们的研究结果表明,电压或电流控制可用于减少新兴存储器件的焦耳损耗。
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Reduction of Joule Losses in Memristive Switching Using Optimal Control
This theoretical study investigates strategies for minimizing Joule losses in resistive random access memory (ReRAM) cells, which are also referred to as memristive devices. Typically, the structure of ReRAM cells involves a nanoscale layer of resistance-switching material sandwiched between two metal electrodes. The basic question that we ask is what is the optimal driving protocol to switch a memristive device from one state to another. In the case of ideal memristors, in the most basic scenario, the optimal protocol is determined by solving a variational problem without constraints with the help of the Euler-Lagrange equation. In the case of memristive systems, for the same situation, the optimal protocol is found using the method of Lagrange multipliers. We demonstrate the advantages of our approaches through specific examples and compare our results with those of switching with constant voltage or current. Our findings suggest that voltage or current control can be used to reduce Joule losses in emerging memory devices.
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来源期刊
IEEE Transactions on Nanotechnology
IEEE Transactions on Nanotechnology 工程技术-材料科学:综合
CiteScore
4.80
自引率
8.30%
发文量
74
审稿时长
8.3 months
期刊介绍: The IEEE Transactions on Nanotechnology is devoted to the publication of manuscripts of archival value in the general area of nanotechnology, which is rapidly emerging as one of the fastest growing and most promising new technological developments for the next generation and beyond.
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Improvement of Surface Roughness in SiO2 Thin Films via Deuterium Annealing at 300 °C On the Importance of the Metal Catalyst Layer to the Performance of CNT-Based Supercapacitor Electrodes Table of Contents Front Cover IEEE Transactions on Nanotechnology Publication Information
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