Samuel Tlemsani;Stéphane Ricq;Olivier Marcelot;Emilie De Pretto;Jean-Pierre Carrere;Thomas Dalleau;Pierre Magnan
{"title":"光电门像素的电容性深沟槽界面表征和暗电流建模","authors":"Samuel Tlemsani;Stéphane Ricq;Olivier Marcelot;Emilie De Pretto;Jean-Pierre Carrere;Thomas Dalleau;Pierre Magnan","doi":"10.1109/TED.2024.3501255","DOIUrl":null,"url":null,"abstract":"In a CMOS image sensor, the total dark current (DC) is the sum of several contributions that are difficult to discriminate, even if activation energies are extracted. For example, when considering the interface generation, there may still be ambiguities about which interface, whether the front-side, back-side, or trench isolation is dominant. Electrical characterizations on test structures are powerful tools for investigating specific interfaces and providing complementary information, such as passivation quality. In this work, chemical and field-effect passivation are studied using capacitance-voltage measurements on a dedicated test structure. Quantitative results are obtained, enabling the computation of DC based on the Shockley-Read–Hall (SRH) formalism. This model, which depends on the voltage applied to the trench, fits direct DC measurements.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"72 1","pages":"37-43"},"PeriodicalIF":2.9000,"publicationDate":"2024-12-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Capacitive Deep Trench Interface Characterizations and Dark Current Modeling for Photogate Pixels\",\"authors\":\"Samuel Tlemsani;Stéphane Ricq;Olivier Marcelot;Emilie De Pretto;Jean-Pierre Carrere;Thomas Dalleau;Pierre Magnan\",\"doi\":\"10.1109/TED.2024.3501255\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In a CMOS image sensor, the total dark current (DC) is the sum of several contributions that are difficult to discriminate, even if activation energies are extracted. For example, when considering the interface generation, there may still be ambiguities about which interface, whether the front-side, back-side, or trench isolation is dominant. Electrical characterizations on test structures are powerful tools for investigating specific interfaces and providing complementary information, such as passivation quality. In this work, chemical and field-effect passivation are studied using capacitance-voltage measurements on a dedicated test structure. Quantitative results are obtained, enabling the computation of DC based on the Shockley-Read–Hall (SRH) formalism. This model, which depends on the voltage applied to the trench, fits direct DC measurements.\",\"PeriodicalId\":13092,\"journal\":{\"name\":\"IEEE Transactions on Electron Devices\",\"volume\":\"72 1\",\"pages\":\"37-43\"},\"PeriodicalIF\":2.9000,\"publicationDate\":\"2024-12-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Transactions on Electron Devices\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10772698/\",\"RegionNum\":2,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10772698/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Capacitive Deep Trench Interface Characterizations and Dark Current Modeling for Photogate Pixels
In a CMOS image sensor, the total dark current (DC) is the sum of several contributions that are difficult to discriminate, even if activation energies are extracted. For example, when considering the interface generation, there may still be ambiguities about which interface, whether the front-side, back-side, or trench isolation is dominant. Electrical characterizations on test structures are powerful tools for investigating specific interfaces and providing complementary information, such as passivation quality. In this work, chemical and field-effect passivation are studied using capacitance-voltage measurements on a dedicated test structure. Quantitative results are obtained, enabling the computation of DC based on the Shockley-Read–Hall (SRH) formalism. This model, which depends on the voltage applied to the trench, fits direct DC measurements.
期刊介绍:
IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.