基于谐波脉宽亚阈值的GaN hemt高精度热阻测量方法

IF 2.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Transactions on Electron Devices Pub Date : 2024-11-15 DOI:10.1109/TED.2024.3493062
Ningyu Luo;Huiqing Wen;Wen Liu;Lin Jiang
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引用次数: 0

摘要

氮化镓(GaN)高电子迁移率晶体管(hemt)的结温和热阻研究是保证其高工作可靠性的必要条件。在不同类型的热阻测量方法中,温度敏感电参数(TSEP)方法在在线实现、准确性和适用性方面具有独特的优势。本文在回顾现有GaN hemt TSEP测量方法的基础上,提出了一种基于加热功率调制策略的GaN hemt高精度热阻测量方法——谐波脉宽亚阈值法(HPWS)。具体而言,利用GaN hemt的亚阈值摆幅(SS)与温度之间的敏感线性相关性,对加热功率信号的关断瞬态进行采样,通过对加热信号调制的频域扫描提取热阻。因此,所提出的HPWS方法可以滤除壳体温度波动和测量脉冲信号延迟带来的负面影响,最大限度地减少非线性或低灵敏度带来的误差。将该方法与两种经典方法进行了实验比较。介绍了GaN HEMT热阻与漏极电流关系的主要实验比较结果。实验结果表明,在各种漏极电流条件下,该方法与两种经典方法的误差均小于2%。此外,对影响GaN hemt热阻测量精度的主要因素进行了系统分析。
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High-Accuracy Thermal Resistance Measurement Method for GaN HEMTs Based on Harmonic Pulsewidth Subthreshold
The study on the junction temperature and thermal resistance of gallium nitride (GaN) high electron mobility transistors (HEMTs) becomes essential in order to ensure high operating reliability. Among different categories of thermal resistance measurement methods, the temperature-sensitive electrical parameter (TSEP) method exhibits unique advantages in terms of online implementation, accuracy, and applicability. After reviewing current TSEP methods for GaN HEMTs, this article proposes a high-accuracy thermal resistance measurement method for GaN HEMTs based on a heating power modulation strategy, which is named the harmonic pulsewidth subthreshold (HPWS) method. Specifically, the sensitive linear correlation between the subthreshold swing (SS) of GaN HEMTs and temperature will be utilized, and the turn-off transients of the heating power signal will be sampled to extract the thermal resistance through frequency-domain scanning of the heating signal modulation. Thus, the proposed HPWS method can filter out negative effects caused by case temperature fluctuations and the measurement impulse signal delay, which can minimize possible errors caused by nonlinearity or low sensitivity. An experimental comparison of the proposed method with two classical methods was conducted. Main experimental comparison results of the relationship between GaN HEMT thermal resistance and drain current were also introduced. The experimental results indicated that the differences between the proposed method and two classical methods at all various drain current conditions were less than 2%. Besides, a systematic analysis was conducted on main factors determining the accuracy of the thermal resistance measurement for GaN HEMTs.
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来源期刊
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices 工程技术-工程:电子与电气
CiteScore
5.80
自引率
16.10%
发文量
937
审稿时长
3.8 months
期刊介绍: IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
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