{"title":"热离子真空电弧等离子体沉积氧化锌/五氧化二钒复合薄膜","authors":"Çağrı Durmuş , Uğur Demirkol , Tamer Akan","doi":"10.1016/j.tsf.2025.140631","DOIUrl":null,"url":null,"abstract":"<div><div>The study involved the deposition of Zinc oxide/vanadium pentoxide (ZnO/V<sub>2</sub>O<sub>5</sub>) composite thin films on the glass substrates using the Thermionic Vacuum Arc (TVA) plasma process. Three methods were employed: (1) ZnO and V<sub>2</sub>O<sub>5</sub> powders were mixed in a 50:50 molar ratio, and plasma was generated in the same crucible (V + <em>Z</em>), (2) V<sub>2</sub>O<sub>5</sub> plasma was deposited first, followed by ZnO (VZ), and (3) ZnO plasma was deposited first, followed by V<sub>2</sub>O<sub>5</sub> (ZV). These deposition processes were performed entirely within the TVA system without removing the samples from the vacuum environment. This approach significantly reduced the risk of contamination and minimized processing time compared to conventional techniques. The structural, elemental, surface morphological, optical, and antibacterial properties of the deposited thin films were extensively investigated. The thin films exhibited primarily amorphous structures with some crystalline formations. Optical analysis revealed a single bandgap of 3.63 eV for the V + <em>Z</em> sample, while VZ and ZV samples displayed dual bandgaps (2.40 eV & 3.48 eV for VZ; 2.48 eV & 3.15 eV for ZV). Antibacterial tests showed that VZ and ZV thin films had superior activity, completely inhibiting <em>Staphylococcus aureus</em> and <em>Escherichia coli</em> after 2 h, compared to the lower inhibition observed with V + <em>Z</em> films. These findings demonstrate the potential of ZnO/ V<sub>2</sub>O<sub>5</sub> composite thin films, particularly layered structures, for applications requiring enhanced antibacterial properties.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"814 ","pages":"Article 140631"},"PeriodicalIF":2.0000,"publicationDate":"2025-03-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Deposition of zinc oxide/vanadium pentoxide composite thin films by thermionic vacuum arc plasma\",\"authors\":\"Çağrı Durmuş , Uğur Demirkol , Tamer Akan\",\"doi\":\"10.1016/j.tsf.2025.140631\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>The study involved the deposition of Zinc oxide/vanadium pentoxide (ZnO/V<sub>2</sub>O<sub>5</sub>) composite thin films on the glass substrates using the Thermionic Vacuum Arc (TVA) plasma process. Three methods were employed: (1) ZnO and V<sub>2</sub>O<sub>5</sub> powders were mixed in a 50:50 molar ratio, and plasma was generated in the same crucible (V + <em>Z</em>), (2) V<sub>2</sub>O<sub>5</sub> plasma was deposited first, followed by ZnO (VZ), and (3) ZnO plasma was deposited first, followed by V<sub>2</sub>O<sub>5</sub> (ZV). These deposition processes were performed entirely within the TVA system without removing the samples from the vacuum environment. This approach significantly reduced the risk of contamination and minimized processing time compared to conventional techniques. The structural, elemental, surface morphological, optical, and antibacterial properties of the deposited thin films were extensively investigated. The thin films exhibited primarily amorphous structures with some crystalline formations. Optical analysis revealed a single bandgap of 3.63 eV for the V + <em>Z</em> sample, while VZ and ZV samples displayed dual bandgaps (2.40 eV & 3.48 eV for VZ; 2.48 eV & 3.15 eV for ZV). Antibacterial tests showed that VZ and ZV thin films had superior activity, completely inhibiting <em>Staphylococcus aureus</em> and <em>Escherichia coli</em> after 2 h, compared to the lower inhibition observed with V + <em>Z</em> films. These findings demonstrate the potential of ZnO/ V<sub>2</sub>O<sub>5</sub> composite thin films, particularly layered structures, for applications requiring enhanced antibacterial properties.</div></div>\",\"PeriodicalId\":23182,\"journal\":{\"name\":\"Thin Solid Films\",\"volume\":\"814 \",\"pages\":\"Article 140631\"},\"PeriodicalIF\":2.0000,\"publicationDate\":\"2025-03-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Thin Solid Films\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S004060902500032X\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"2025/2/18 0:00:00\",\"PubModel\":\"Epub\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, COATINGS & FILMS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thin Solid Films","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S004060902500032X","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2025/2/18 0:00:00","PubModel":"Epub","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0
摘要
采用热离子真空电弧(TVA)等离子体工艺在玻璃基板上沉积氧化锌/五氧化钒(ZnO/V2O5)复合薄膜。采用三种方法:(1)将ZnO和V2O5粉末以50:50的摩尔比混合,在同一坩埚(V + Z)中生成等离子体,(2)先沉积V2O5等离子体,然后是ZnO (VZ),(3)先沉积ZnO等离子体,然后是V2O5 (ZV)。这些沉积过程完全在TVA系统中进行,没有从真空环境中取出样品。与传统技术相比,这种方法显著降低了污染风险,并最大限度地缩短了处理时间。研究了薄膜的结构、元素、表面形态、光学和抗菌性能。薄膜主要表现为非晶结构,并有一些结晶结构。光学分析显示,V + Z样品的单带隙为3.63 eV,而VZ和ZV样品显示双带隙(2.40 eV &;3.48 eV为VZ;2.48 eV &;3.15 eV为ZV)。抑菌试验表明,VZ和ZV薄膜具有较好的抑菌活性,在2 h后可完全抑制金黄色葡萄球菌和大肠杆菌,而V + Z薄膜的抑菌活性较低。这些发现证明了ZnO/ V2O5复合薄膜的潜力,特别是层状结构,用于需要增强抗菌性能的应用。
Deposition of zinc oxide/vanadium pentoxide composite thin films by thermionic vacuum arc plasma
The study involved the deposition of Zinc oxide/vanadium pentoxide (ZnO/V2O5) composite thin films on the glass substrates using the Thermionic Vacuum Arc (TVA) plasma process. Three methods were employed: (1) ZnO and V2O5 powders were mixed in a 50:50 molar ratio, and plasma was generated in the same crucible (V + Z), (2) V2O5 plasma was deposited first, followed by ZnO (VZ), and (3) ZnO plasma was deposited first, followed by V2O5 (ZV). These deposition processes were performed entirely within the TVA system without removing the samples from the vacuum environment. This approach significantly reduced the risk of contamination and minimized processing time compared to conventional techniques. The structural, elemental, surface morphological, optical, and antibacterial properties of the deposited thin films were extensively investigated. The thin films exhibited primarily amorphous structures with some crystalline formations. Optical analysis revealed a single bandgap of 3.63 eV for the V + Z sample, while VZ and ZV samples displayed dual bandgaps (2.40 eV & 3.48 eV for VZ; 2.48 eV & 3.15 eV for ZV). Antibacterial tests showed that VZ and ZV thin films had superior activity, completely inhibiting Staphylococcus aureus and Escherichia coli after 2 h, compared to the lower inhibition observed with V + Z films. These findings demonstrate the potential of ZnO/ V2O5 composite thin films, particularly layered structures, for applications requiring enhanced antibacterial properties.
期刊介绍:
Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.