利用石英晶体微天平实时监测光刻胶的光降解

IF 4.6 3区 化学 Q2 CHEMISTRY, MULTIDISCIPLINARY RSC Advances Pub Date : 2025-04-17 DOI:10.1039/D4RA05762G
Zhun Gu, Kaitong Yang, Hayford Boamah, Dong Chen, Zhiqiang Zhu and Jie Wang
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引用次数: 0

摘要

我们报道了一种将激光照射与石英晶体微平衡(QCM)传感技术相结合的实时评估光刻胶性能的定量方法。对AZ1518光刻胶模型的计算结果与传统的计算结果相吻合。此外,该体系在光反应过程中表现出粘弹性转变和剪切应力演化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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Real-time monitoring of photodegradation in photoresists using a quartz crystal microbalance†

We report a quantitative method for the real-time evaluation of photoresist performance that integrates laser irradiation with quartz crystal microbalance (QCM) sensing technology. The results obtained for the model photoresist AZ1518 correlated with the traditionally obtained ones. Furthermore, the system revealed viscoelastic transitions and shear stress evolution during photoreactions.

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来源期刊
RSC Advances
RSC Advances chemical sciences-
CiteScore
7.50
自引率
2.60%
发文量
3116
审稿时长
1.6 months
期刊介绍: An international, peer-reviewed journal covering all of the chemical sciences, including multidisciplinary and emerging areas. RSC Advances is a gold open access journal allowing researchers free access to research articles, and offering an affordable open access publishing option for authors around the world.
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