掺杂和共掺杂硅纳米晶体:表面和界面的作用

IF 8.7 2区 工程技术 Q1 CHEMISTRY, PHYSICAL Progress in Surface Science Pub Date : 2017-12-01 DOI:10.1016/j.progsurf.2017.07.003
Ivan Marri, Elena Degoli, Stefano Ossicini
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引用次数: 29

摘要

硅纳米晶体由于其新颖的性质和在电子、光电、光伏、热电和生物器件方面的潜在应用而受到广泛的研究。这些新性质是通过载流子的量子约束和表面化学的强大影响相结合而实现的。与体硅的情况一样,电子、光学和输运性质的调整与纳米晶体以可控方式掺杂的可能性有关。这是一个巨大的挑战,因为几项研究表明,硅纳米晶体中的掺杂与体中的掺杂不同。理论和实验表明,掺杂和共掺杂受到硅纳米晶体尺寸、形状、钝化和化学环境等诸多参数的影响。然而,这些参数与掺杂剂的定位以及自净化效应的发生之间的关系尚不清楚。在这篇综述中,我们从理论和实验的角度总结了这一引人注目的研究领域的最新进展,包括独立的和基质嵌入的硅纳米晶体,特别关注通过从头计算得到的结果以及尺寸、表面和界面诱导的效应。
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Doped and codoped silicon nanocrystals: The role of surfaces and interfaces

Si nanocrystals have been extensively studied because of their novel properties and their potential applications in electronic, optoelectronic, photovoltaic, thermoelectric and biological devices. These new properties are achieved through the combination of the quantum confinement of carriers and the strong influence of surface chemistry. As in the case of bulk Si the tuning of the electronic, optical and transport properties is related to the possibility of doping, in a controlled way, the nanocrystals. This is a big challenge since several studies have revealed that doping in Si nanocrystals differs from the one of the bulk. Theory and experiments have underlined that doping and codoping are influenced by a large number of parameters such as size, shape, passivation and chemical environment of the silicon nanocrystals. However, the connection between these parameters and dopant localization as well as the occurrence of self-purification effects are still not clear. In this review we summarize the latest progress in this fascinating research field considering free-standing and matrix-embedded Si nanocrystals both from the theoretical and experimental point of view, with special attention given to the results obtained by ab-initio calculations and to size-, surface- and interface-induced effects.

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来源期刊
Progress in Surface Science
Progress in Surface Science 工程技术-物理:凝聚态物理
CiteScore
11.30
自引率
0.00%
发文量
10
审稿时长
3 months
期刊介绍: Progress in Surface Science publishes progress reports and review articles by invited authors of international stature. The papers are aimed at surface scientists and cover various aspects of surface science. Papers in the new section Progress Highlights, are more concise and general at the same time, and are aimed at all scientists. Because of the transdisciplinary nature of surface science, topics are chosen for their timeliness from across the wide spectrum of scientific and engineering subjects. The journal strives to promote the exchange of ideas between surface scientists in the various areas. Authors are encouraged to write articles that are of relevance and interest to both established surface scientists and newcomers in the field.
期刊最新文献
Editorial Board Current perspective towards a general framework to describe and harness friction at the nanoscale Time-resolved photoemission electron microscopy of semiconductor interfaces Editorial Board Structural dynamics in atomic indium wires on silicon: From ultrafast probing to coherent vibrational control
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