Pub Date : 2026-02-01Epub Date: 2026-02-03DOI: 10.1016/j.progsurf.2025.100809
Stanisław Krukowski, Pawel Kempisty, Pawel Strak
<div><div>Recent progress in the investigation of the role of charge on semiconductor surfaces has been reviewed. The review begins with contributions to the calculations and data analysis. This new procedure includes the application of the Laplace correction method in <em>ab initio</em> calculations. The new analysis incorporates the projected density of states (PDOS) and Crystal Orbital Hamilton Population (COHP) and averaging of the electric potential to derive its smoothed long-range variation in space, parallel to plots of real-space band profiles. These methods include the discovery of spurious Coulomb interactions between the separated subsystems, which have different Fermi levels. The <em>ab initio</em> use of a single Fermi level may cause incorrect electron redistribution, an artificial charge of the separated subsystems, and spurious interactions. The quantum nature of the charge influence on semiconductor surfaces stems from the delocalization of electrons, which leads to the emergence of an external surface dipole, which is important for determining the workfunction and plays a role in the proposed thermalization of the adsorbate via electron tunnelling. The kinetic energy loss of the adsorbate (i.e., its thermalization) occurs via the tunnelling of electrons into the solid interior owing to the strong external dipole electric field. The other charge-related quantum effect is related to the known subsurface dipole charge layer. New simulations of the variation of the electric potential within a slab model show the band bending at the semiconductor surfaces that induces the Surface States Stark Effect (SSSE) and misrepresents the surface band diagrams. This underlines the role of pinning the Fermi level and its connection to subsurface dipoles. The charge balance determines the occupation of the surface states and the symmetry and periodicity of surface reconstructions. The occupation of the surface states may be changed by adsorption, both by the new donated electrons and by the emergence of new quantum states. As their numbers could be different, this leads to a jump in the Fermi level pinning and adsorption energy at selected critical coverages. Thus, the Fermi level becomes free, subsurface dipoles disappear, and bands become flat. The adsorption energy jump may reach several electronvolts, which may change the adsorbate equilibrium vapor pressure by several orders of magnitude. Such a flat-band state is likely to occur during the growth of crystals that fall within such pressure intervals. Additionally, quantum effects may include resonant bonding involving several states, which leads to fractional occupation. The existence of resonant states resolves the existing inconsistencies between bonding and lattice symmetry in nitrides. This effect is observed not only at the stability points but also at the activated complex position in the diffusion jumps. Additionally, the effects include the quantum state energy increase during the j
{"title":"Charge control of semiconductor surfaces as elucidated by ab initio calculations – A review","authors":"Stanisław Krukowski, Pawel Kempisty, Pawel Strak","doi":"10.1016/j.progsurf.2025.100809","DOIUrl":"10.1016/j.progsurf.2025.100809","url":null,"abstract":"<div><div>Recent progress in the investigation of the role of charge on semiconductor surfaces has been reviewed. The review begins with contributions to the calculations and data analysis. This new procedure includes the application of the Laplace correction method in <em>ab initio</em> calculations. The new analysis incorporates the projected density of states (PDOS) and Crystal Orbital Hamilton Population (COHP) and averaging of the electric potential to derive its smoothed long-range variation in space, parallel to plots of real-space band profiles. These methods include the discovery of spurious Coulomb interactions between the separated subsystems, which have different Fermi levels. The <em>ab initio</em> use of a single Fermi level may cause incorrect electron redistribution, an artificial charge of the separated subsystems, and spurious interactions. The quantum nature of the charge influence on semiconductor surfaces stems from the delocalization of electrons, which leads to the emergence of an external surface dipole, which is important for determining the workfunction and plays a role in the proposed thermalization of the adsorbate via electron tunnelling. The kinetic energy loss of the adsorbate (i.e., its thermalization) occurs via the tunnelling of electrons into the solid interior owing to the strong external dipole electric field. The other charge-related quantum effect is related to the known subsurface dipole charge layer. New simulations of the variation of the electric potential within a slab model show the band bending at the semiconductor surfaces that induces the Surface States Stark Effect (SSSE) and misrepresents the surface band diagrams. This underlines the role of pinning the Fermi level and its connection to subsurface dipoles. The charge balance determines the occupation of the surface states and the symmetry and periodicity of surface reconstructions. The occupation of the surface states may be changed by adsorption, both by the new donated electrons and by the emergence of new quantum states. As their numbers could be different, this leads to a jump in the Fermi level pinning and adsorption energy at selected critical coverages. Thus, the Fermi level becomes free, subsurface dipoles disappear, and bands become flat. The adsorption energy jump may reach several electronvolts, which may change the adsorbate equilibrium vapor pressure by several orders of magnitude. Such a flat-band state is likely to occur during the growth of crystals that fall within such pressure intervals. Additionally, quantum effects may include resonant bonding involving several states, which leads to fractional occupation. The existence of resonant states resolves the existing inconsistencies between bonding and lattice symmetry in nitrides. This effect is observed not only at the stability points but also at the activated complex position in the diffusion jumps. Additionally, the effects include the quantum state energy increase during the j","PeriodicalId":416,"journal":{"name":"Progress in Surface Science","volume":"101 1","pages":"Article 100809"},"PeriodicalIF":7.2,"publicationDate":"2026-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146184934","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2026-02-01Epub Date: 2026-02-03DOI: 10.1016/j.progsurf.2026.100810
Kai Wen Zheng, Wang Gao
Small-molecule adsorption dominates many interfacial processes such as solid–gas heterogeneous catalysis, electrochemistry, and corrosion, with the interfacial binding strength, the adsorption energy, controlled by the electronic and geometric properties of both molecules and substrates. In past years, numerous physical models and descriptors have been proposed to determine the adsorption energy. These models offer valuable insights into the trends of adsorption energy from different perspectives. Understanding the differences and intrinsic connections among these models is conducive to developing new, universally applicable, and effective descriptors for adsorption energies. We systematically review and compare the potential descriptors of adsorption energies across transition metals, alloys, and oxide systems, focusing on the underlying physical pictures. By elaborating on the physical correlations among these descriptors, we show that the electronic descriptor ψ of the analytic-parameter model (APM), based on the intrinsic properties of the surface atoms—the valence electron number Sv and the electronegativity χ, provides a promising way for the quantitative description of the adsorption energy. More importantly, APM greatly enhances the practicality of previous models by simplifying the complex physical picture into easily accessible parameters.
{"title":"Progress of the descriptors of adsorption energies on solids","authors":"Kai Wen Zheng, Wang Gao","doi":"10.1016/j.progsurf.2026.100810","DOIUrl":"10.1016/j.progsurf.2026.100810","url":null,"abstract":"<div><div>Small-molecule adsorption dominates many interfacial processes such as solid–gas heterogeneous catalysis, electrochemistry, and corrosion, with the interfacial binding strength, the adsorption energy, controlled by the electronic and geometric properties of both molecules and substrates. In past years, numerous physical models and descriptors have been proposed to determine the adsorption energy. These models offer valuable insights into the trends of adsorption energy from different perspectives. Understanding the differences and intrinsic connections among these models is conducive to developing new, universally applicable, and effective descriptors for adsorption energies. We systematically review and compare the potential descriptors of adsorption energies across transition metals, alloys, and oxide systems, focusing on the underlying physical pictures. By elaborating on the physical correlations among these descriptors, we show that the electronic descriptor <em>ψ</em> of the analytic-parameter model (APM), based on the intrinsic properties of the surface atoms—the valence electron number <em>S</em><sub>v</sub> and the electronegativity <em>χ</em>, provides a promising way for the quantitative description of the adsorption energy. More importantly, APM greatly enhances the practicality of previous models by simplifying the complex physical picture into easily accessible parameters.</div></div>","PeriodicalId":416,"journal":{"name":"Progress in Surface Science","volume":"101 1","pages":"Article 100810"},"PeriodicalIF":7.2,"publicationDate":"2026-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"146184935","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2026-02-01Epub Date: 2025-12-25DOI: 10.1016/j.progsurf.2025.100807
Laura Cepauskaite, Regita Bendikiene
Laser Surface Texturing (LST) is a precise and versatile method for modifying the surface of materials to improve their functional properties in various industrial applications. This review highlights the most important achievements of LST, focusing on its ability to tailor surface properties such as wettability, mechanical properties, corrosion resistance, and biocompatibility. The main results show that LST is a sustainable and effective alternative to traditional surface modification methods, reducing the need for chemical treatment and excess material use. The review also describes the transformative potential of LST for future innovations in materials science and engineering, while pointing out current limitations and areas for further research.
{"title":"The role of laser surface texturing for environmentally friendly surface engineering applications: a review","authors":"Laura Cepauskaite, Regita Bendikiene","doi":"10.1016/j.progsurf.2025.100807","DOIUrl":"10.1016/j.progsurf.2025.100807","url":null,"abstract":"<div><div>Laser Surface Texturing (LST) is a precise and versatile method for modifying the surface of materials to improve their functional properties in various industrial applications. This review highlights the most important achievements of LST, focusing on its ability to tailor surface properties such as wettability, mechanical properties, corrosion resistance, and biocompatibility. The main results show that LST is a sustainable and effective alternative to traditional surface modification methods, reducing the need for chemical treatment and excess material use. The review also describes the transformative potential of LST for future innovations in materials science and engineering, while pointing out current limitations and areas for further research.</div></div>","PeriodicalId":416,"journal":{"name":"Progress in Surface Science","volume":"101 1","pages":"Article 100807"},"PeriodicalIF":7.2,"publicationDate":"2026-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145814180","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2026-02-01Epub Date: 2026-01-08DOI: 10.1016/j.progsurf.2025.100808
I.G. Shuttleworth
Van der Waals (vdW) complexes, surfaces and interfaces are a current ‘hot-topic’ in surface science. Their importance for surfaces, layered structures and interfaces stems from weak interlayer binding which allows strain to be applied relatively easily, particularly when compared to more rigid covalently bound systems, and used to tune the behaviour and properties of the material. Most ab-initio studies of extended vdW systems focus on the geometric (layering) and electronic properties, including fundamental quantities like the work function. Far fewer investigations highlight the thermal properties of these layers, including in many cases even the most basic phonon characterization.
In this article the utility of dynamical studies of layered and interfacial vdW systems will be highlighted. The weak coupling between the layers of a vdW interface enables efficient coupling between modes; however, ‘veering’, the effects of the orientation of subsequent layers and strain engineering can limit the redistribution of vibrational energy. This article will discuss some case studies of these effects and discuss their limitations; in particular, examples involving graphene, black phosphorus and hBN will be included together with a discussion of systematic design strategies which have been currently seen to optimize thermal energy transfer in these materials.
{"title":"Vibrational signatures in layered materials","authors":"I.G. Shuttleworth","doi":"10.1016/j.progsurf.2025.100808","DOIUrl":"10.1016/j.progsurf.2025.100808","url":null,"abstract":"<div><div>Van der Waals (vdW) complexes, surfaces and interfaces are a current ‘hot-topic’ in surface science. Their importance for surfaces, layered structures and interfaces stems from weak interlayer binding which allows strain to be applied relatively easily, particularly when compared to more rigid covalently bound systems, and used to tune the behaviour and properties of the material. Most <em>ab-initio</em> studies of extended vdW systems focus on the geometric (layering) and electronic properties, including fundamental quantities like the work function. Far fewer investigations highlight the thermal properties of these layers, including in many cases even the most basic phonon characterization.</div><div>In this article the utility of dynamical studies of layered and interfacial vdW systems will be highlighted. The weak coupling between the layers of a vdW interface enables efficient coupling between modes; however, ‘veering’, the effects of the orientation of subsequent layers and strain engineering can limit the redistribution of vibrational energy. This article will discuss some case studies of these effects and discuss their limitations; in particular, examples involving graphene, black phosphorus and hBN will be included together with a discussion of systematic design strategies which have been currently seen to optimize thermal energy transfer in these materials.</div></div>","PeriodicalId":416,"journal":{"name":"Progress in Surface Science","volume":"101 1","pages":"Article 100808"},"PeriodicalIF":7.2,"publicationDate":"2026-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145939809","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-12-01Epub Date: 2025-10-29DOI: 10.1016/j.progsurf.2025.100798
Emrah Koç , Bahtiyar G. Salamov
Under the conditions of low-temperature plasma, this work proposes a new controllable express method for transformation of nano-sized Bi films into semiconducting Bi2O3 films in a modified plasma microreactor with GaAs photosensitive plate. The transformation mechanism of Bi films depends on the current density, charge transferred, and exposure time. From the mechanism of formation of Bi2O3 semiconductor film, we have established: 1) that this is a surface process that moves deeper into the Bi film when the operation parameters change; 2) the band gap value of the Bi2O3 semiconductor film obtained from Tauc’s plot is Eg ≈ 3 eV; 3) that this process is provided by the combined kinetic energy of electrons and oxygen ions.
{"title":"Influence of space charge carriers and active plasma components of DC Townsend discharge on the surface transformation of nano-sized Bi films","authors":"Emrah Koç , Bahtiyar G. Salamov","doi":"10.1016/j.progsurf.2025.100798","DOIUrl":"10.1016/j.progsurf.2025.100798","url":null,"abstract":"<div><div>Under the conditions of low-temperature plasma, this work proposes a new controllable express method for transformation of nano-sized Bi films into semiconducting Bi<sub>2</sub>O<sub>3</sub> films in a modified plasma microreactor with GaAs photosensitive plate. The transformation mechanism of Bi films depends on the current density, charge transferred, and exposure time. From the mechanism of formation of Bi<sub>2</sub>O<sub>3</sub> semiconductor film, we have established: 1) that this is a surface process that moves deeper into the Bi film when the operation parameters change; 2) the band gap value of the Bi<sub>2</sub>O<sub>3</sub> semiconductor film obtained from Tauc’s plot is <em>E<sub>g</sub></em> ≈ 3 eV; 3) that this process is provided by the combined kinetic energy of electrons and oxygen ions.</div></div>","PeriodicalId":416,"journal":{"name":"Progress in Surface Science","volume":"100 4","pages":"Article 100798"},"PeriodicalIF":7.2,"publicationDate":"2025-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145425364","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-12-01Epub Date: 2025-10-21DOI: 10.1016/j.progsurf.2025.100795
Takeshi Suzuki , Kozo Okazaki
Recent advancements in ultrafast laser systems and high harmonic generation (HHG) techniques have enabled time-resolved photoemission spectroscopy on femtosecond timescales, opening up unprecedented opportunities to explore quantum materials in both time and momentum space. In this review, we present recent representative studies utilizing HHG-laser-based time- and angle resolved photoemission spectroscopy for a variety of quantum materials. We particularly highlight electron–phonon interactions and non-equilibrium dynamics in time and frequency domain, through which rich information about non-equilibrium electron–phonon couplings and related phenomena has been clearly revealed.
{"title":"Time-resolved photoemission spectroscopy of quantum materials using high harmonic generation: probing electron-phonon interactions and non-equilibrium dynamics","authors":"Takeshi Suzuki , Kozo Okazaki","doi":"10.1016/j.progsurf.2025.100795","DOIUrl":"10.1016/j.progsurf.2025.100795","url":null,"abstract":"<div><div>Recent advancements in ultrafast laser systems and high harmonic generation (HHG) techniques have enabled time-resolved photoemission spectroscopy on femtosecond timescales, opening up unprecedented opportunities to explore quantum materials in both time and momentum space. In this review, we present recent representative studies utilizing HHG-laser-based time- and angle resolved photoemission spectroscopy for a variety of quantum materials. We particularly highlight electron–phonon interactions and non-equilibrium dynamics in time and frequency domain, through which rich information about non-equilibrium electron–phonon couplings and related phenomena has been clearly revealed.</div></div>","PeriodicalId":416,"journal":{"name":"Progress in Surface Science","volume":"100 4","pages":"Article 100795"},"PeriodicalIF":7.2,"publicationDate":"2025-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145334960","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-12-01Epub Date: 2025-10-23DOI: 10.1016/j.progsurf.2025.100797
Loris Chavée , Stéphane Lucas , Nicolas Stein , Thierry Brousse , Emile Haye
The deposition of functional coatings by Physical Vapor Deposition (PVD) on open-cell 3D foams represents a burgeoning area within material science, especially for electrochemical applications. Due to the novelty of this field and the unique geometry of the foams, the use of PVD on these substrates is a breakthrough innovation for functional material development. However, several challenges remain, e.g. understanding film growth mechanisms on foams, their impact on electrochemical processes, and optimizing the performance of coated foams across various applications through an understanding of the electrochemical phenomena occurring inside and on the surface of the coated foams. This review provides the first thorough overview of the current state-of-the-art in this area and suggests innovative solutions to the challenges encountered. It reports the various properties of films on foams reported in literature, compares the electrochemical performance of PVD-coated foams for Oxygen Evolution Reaction (OER)/Hydrogen Evolution Reaction (HER) catalysis, and energy storage applications, and discusses the mechanisms that explain their performance. Additionally, the review offers an analysis of existing research and introduces a novel numerical methodology, integrating Direct Simulation Monte Carlo (DSMC), Particle-in-Cell Monte Carlo (PICMC), and kinetic Monte Carlo (kMC) techniques to facilitate the characterization of coatings within the foams.
{"title":"PVD coatings on open-cell 3D foams for electrochemical applications: A review","authors":"Loris Chavée , Stéphane Lucas , Nicolas Stein , Thierry Brousse , Emile Haye","doi":"10.1016/j.progsurf.2025.100797","DOIUrl":"10.1016/j.progsurf.2025.100797","url":null,"abstract":"<div><div>The deposition of functional coatings by Physical Vapor Deposition (PVD) on open-cell 3D foams represents a burgeoning area within material science, especially for electrochemical applications. Due to the novelty of this field and the unique geometry of the foams, the use of PVD on these substrates is a breakthrough innovation for functional material development. However, several challenges remain, e.g. understanding film growth mechanisms on foams, their impact on electrochemical processes, and optimizing the performance of coated foams across various applications through an understanding of the electrochemical phenomena occurring inside and on the surface of the coated foams. This review provides the first thorough overview of the current state-of-the-art in this area and suggests innovative solutions to the challenges encountered. It reports the various properties of films on foams reported in literature, compares the electrochemical performance of PVD-coated foams for Oxygen Evolution Reaction (OER)/Hydrogen Evolution Reaction (HER) catalysis, and energy storage applications, and discusses the mechanisms that explain their performance. Additionally, the review offers an analysis of existing research and introduces a novel numerical methodology, integrating Direct Simulation Monte Carlo (DSMC), Particle-in-Cell Monte Carlo (PICMC), and kinetic Monte Carlo (kMC) techniques to facilitate the characterization of coatings within the foams.</div></div>","PeriodicalId":416,"journal":{"name":"Progress in Surface Science","volume":"100 4","pages":"Article 100797"},"PeriodicalIF":7.2,"publicationDate":"2025-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145360434","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The growing global demand for energy has positioned photoelectrochemical water splitting as a highly promising method for producing gaseous hydrogen. For this process to be sufficiently effective, the use of semiconductor electrodes with specific properties is required. Among the already proposed semiconductors for this purpose, iron oxides are particularly promising. Therefore, this review paper aims to discuss recent advancements in the fabrication of nanostructured iron oxides through an anodic oxidation of metallic iron and, above all, the possibilities of utilizing these materials in photoelectrochemical systems. The first part of the paper discusses the procedure of Fe anodization with particular emphasis on the correlation between synthesis conditions and the morphology, composition, and properties of the obtained oxide layers. The most important part of the paper is a detailed discussion of the applications of anodically generated iron oxides in photoelectrochemical systems. Strategies for modifying Fe2O3 layers to enhance their photoelectrochemical properties have also been presented. Finally, examples of other applications of anodic iron oxides, as well as challenges and perspectives of the anodic oxidation method, were described.
{"title":"Nanostructured anodic iron oxides for photoelectrochemical applications: recent advances and perspectives","authors":"Karolina Syrek , Magdalena Gurgul-Bednarczyk , Małgorzata Płachta , Bartłomiej Orczykowski , Marta Michalska-Domańska , Leszek Zaraska","doi":"10.1016/j.progsurf.2025.100796","DOIUrl":"10.1016/j.progsurf.2025.100796","url":null,"abstract":"<div><div>The growing global demand for energy has positioned photoelectrochemical water splitting as a highly promising method for producing gaseous hydrogen. For this process to be sufficiently effective, the use of semiconductor electrodes with specific properties is required. Among the already proposed semiconductors for this purpose, iron oxides are particularly promising. Therefore, this review paper aims to discuss recent advancements in the fabrication of nanostructured iron oxides through an anodic oxidation of metallic iron and, above all, the possibilities of utilizing these materials in photoelectrochemical systems. The first part of the paper discusses the procedure of Fe anodization with particular emphasis on the correlation between synthesis conditions and the morphology, composition, and properties of the obtained oxide layers. The most important part of the paper is a detailed discussion of the applications of anodically generated iron oxides in photoelectrochemical systems. Strategies for modifying Fe<sub>2</sub>O<sub>3</sub> layers to enhance their photoelectrochemical properties have also been presented. Finally, examples of other applications of anodic iron oxides, as well as challenges and perspectives of the anodic oxidation method, were described.</div></div>","PeriodicalId":416,"journal":{"name":"Progress in Surface Science","volume":"100 4","pages":"Article 100796"},"PeriodicalIF":7.2,"publicationDate":"2025-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"145360518","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-09-01Epub Date: 2025-08-18DOI: 10.1016/j.progsurf.2025.100781
Xinbin Zhang , Rongping Wang , Shaopeng Meng , Wenhua Chen , Liucheng Zhou , Weifeng He , Xinlei Pan
As a prominent connection technique in modern industry, adhesive technology provides advantages unattainable by conventional methods. It is widely applied in diverse industries, including electronics, medical devices, automotive, and aerospace. Laser surface texturing facilitates the high-precision fabrication of micro/nano-scale surface features, enabling simultaneous control over surface morphology, roughness, and contact angle, thereby enhancing adhesive joint strength. This review focuses on the interfacial bonding strength enhancement achieved via laser texturing technology. We systematically analyze the laser sources, operational classifications, and underlying material interaction mechanisms of laser texturing. Incorporating biomimetic science, this review synthesizes recent advances in texture-induced interface regulation and bonding reinforcement mechanisms. Finally, we discuss the persisting challenges and emerging research directions in laser-texturing-enabled bonding strength improvement.
{"title":"Advances and perspectives in laser texturing for adhesion enhancement: a comprehensive research progress","authors":"Xinbin Zhang , Rongping Wang , Shaopeng Meng , Wenhua Chen , Liucheng Zhou , Weifeng He , Xinlei Pan","doi":"10.1016/j.progsurf.2025.100781","DOIUrl":"10.1016/j.progsurf.2025.100781","url":null,"abstract":"<div><div>As a prominent connection technique in modern industry, adhesive technology provides advantages unattainable by conventional methods. It is widely applied in diverse industries, including electronics, medical devices, automotive, and aerospace. Laser surface texturing facilitates the high-precision fabrication of micro/nano-scale surface features, enabling simultaneous control over surface morphology, roughness, and contact angle, thereby enhancing adhesive joint strength. This review focuses on the interfacial bonding strength enhancement achieved via laser texturing technology. We systematically analyze the laser sources, operational classifications, and underlying material interaction mechanisms of laser texturing. Incorporating biomimetic science, this review synthesizes recent advances in texture-induced interface regulation and bonding reinforcement mechanisms. Finally, we discuss the persisting challenges and emerging research directions in laser-texturing-enabled bonding strength improvement.</div></div>","PeriodicalId":416,"journal":{"name":"Progress in Surface Science","volume":"100 3","pages":"Article 100781"},"PeriodicalIF":7.2,"publicationDate":"2025-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144861044","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2025-06-01Epub Date: 2025-06-27DOI: 10.1016/j.progsurf.2025.100778
Hang You , Yi Peng , Ting Li , Zhengwen Zhang , Yuanqiang Luo
To address the issue of corrosion damage to copper in printed circuit boards (PCBs), electronic components, and other precision parts, the application of superhydrophobic surface technology is utilized to enhance its corrosion resistance properties. In this study, a superhydrophobic CuO/Cu2O/CuCl composite surface was fabricated via a facile one-step chemical etching and modification process. The surface morphology was tailored by optimizing microstructural roughness, while the effects of etching time, etchant concentration, and modification duration on wettability were systematically investigated. Various characterization technologies, such as SEM, X-ray diffraction, and X-ray photoelectron spectroscopy, were utilized to examine surface morphologies, crystalline phases, chemical composition, and wettability. The engineered surface exhibited exceptional superhydrophobicity, with a contact angle (CA) of 161.4 ± 0.3° and a sliding angle (SA) below 3°. Electrochemical assessments revealed outstanding corrosion inhibition efficiency (99.98 %) in 3.5 wt% NaCl solution, corroborated by post-immersion corrosion morphology analysis. Furthermore, the coating demonstrated robust self-cleaning functionality and sustained superhydrophobicity for over 360 days under ambient conditions, highlighting its potential for real-world applications.
{"title":"One-step etching fabrication of superhydrophobic CuO/Cu2O/CuCl hybrid films with integrated anti-corrosion, self-cleaning and long-term stability","authors":"Hang You , Yi Peng , Ting Li , Zhengwen Zhang , Yuanqiang Luo","doi":"10.1016/j.progsurf.2025.100778","DOIUrl":"10.1016/j.progsurf.2025.100778","url":null,"abstract":"<div><div>To address the issue of corrosion damage to copper in printed circuit boards (PCBs), electronic components, and other precision parts, the application of superhydrophobic surface technology is utilized to enhance its corrosion resistance properties. In this study, a superhydrophobic CuO/Cu<sub>2</sub>O/CuCl composite surface was fabricated via a facile one-step chemical etching and modification process. The surface morphology was tailored by optimizing microstructural roughness, while the effects of etching time, etchant concentration, and modification duration on wettability were systematically investigated. Various characterization technologies, such as SEM, X-ray diffraction, and X-ray photoelectron spectroscopy, were utilized to examine surface morphologies, crystalline phases, chemical composition, and wettability. The engineered surface exhibited exceptional superhydrophobicity, with a contact angle (CA) of 161.4 ± 0.3° and a sliding angle (SA) below 3°. Electrochemical assessments revealed outstanding corrosion inhibition efficiency (99.98 %) in 3.5 wt% NaCl solution, corroborated by post-immersion corrosion morphology analysis. Furthermore, the coating demonstrated robust self-cleaning functionality and sustained superhydrophobicity for over 360 days under ambient conditions, highlighting its potential for real-world applications.</div></div>","PeriodicalId":416,"journal":{"name":"Progress in Surface Science","volume":"100 2","pages":"Article 100778"},"PeriodicalIF":8.7,"publicationDate":"2025-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144492064","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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