一项使用半导体剂量计进行口内射线照相半值层测量的初步研究。

IF 1.7 Q3 DENTISTRY, ORAL SURGERY & MEDICINE Imaging Science in Dentistry Pub Date : 2023-09-01 Epub Date: 2023-06-20 DOI:10.5624/isd.20230039
Shun Nouchi, Hidenori Yoshida, Yusaku Miki, Yasuhito Tezuka, Ruri Ogawa, Ichiro Ogura
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引用次数: 0

摘要

目的:进行这项初步研究是为了评估使用半导体剂量计进行口腔内放射照相的半值层(HVL)测量结果。材料和方法:本研究包括8块铝板,其中4块为低纯度(低于99.9%),4块为高纯度(高于99.9%)。根据作者附属医院的牙科协议,使用口腔内X射线装置进行口腔内放射照相术:管电压,60 kVp和70 kVp;管电流,7mA;暴露时间为0.10s。使用半导体剂量计评估口腔内放射照相术的HVL测量的准确性。通过简单回归分析比较了铝板厚度和HVL与管电压(60kVp和70kVp)和铝纯度(低和高)的关系,Y=1.708+0.415X(r=0.999,PPPPC结论:这项初步研究使用半导体剂量计进行口腔内放射照相,检查了铝板厚度与HVL测量之间的关系。半导体剂量计可能在HVL测量中有用,用于牙科X射线成像的质量保证等目的。
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A pilot study of half-value layer measurements using a semiconductor dosimeter for intraoral radiography.

Purpose: This pilot study was conducted to evaluate half-value layer (HVL) measurements obtained using a semiconductor dosimeter for intraoral radiography.

Materials and methods: This study included 8 aluminum plates, 4 of which were low-purity (less than 99.9%) and 4 high-purity (greater than 99.9%). Intraoral radiography was performed using an intraoral X-ray unit in accordance with the dental protocol at the authors' affiliated hospital: tube voltage, 60 kVp and 70 kVp; tube current, 7 mA; and exposure time, 0.10 s. The accuracy of HVL measurements for intraoral radiography was assessed using a semiconductor dosimeter. A simple regression analysis was performed to compare the aluminum plate thickness and HVL in relation to the tube voltage (60 kVp and 70 kVp) and aluminum purity (low and high).

Results: For the low-purity aluminum plates, the HVL at 60 kVp (Y) and 70 kVp (Y) was significantly correlated with the thickness of the aluminum plate (X), with Y = 1.708 + 0.415X (r=0.999, P<0.05) and Y = 1.980 + 0.484X (r=0.999, P<0.05), respectively. Similarly, for the high-purity aluminum plates, the HVL at 60 kVp (Y) and 70 kVp (Y) was significantly correlated with the plate thickness (X), with Y = 1.696 + 0.454X (r=0.999, P<0.05) and Y = 1.968 + 0.515X (r=0.998, P<0.05), respectively.

Conclusion: This pilot study examined the relationship between aluminum plate thickness and HVL measurements using a semiconductor dosimeter for intraoral radiography. Semiconductor dosimeters may prove useful in HVL measurement for purposes such as quality assurance in dental X-ray imaging.

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来源期刊
Imaging Science in Dentistry
Imaging Science in Dentistry DENTISTRY, ORAL SURGERY & MEDICINE-
CiteScore
2.90
自引率
11.10%
发文量
42
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