{"title":"用于高速双光子光刻的敏感光刻胶。","authors":"","doi":"10.1038/s41565-023-01518-9","DOIUrl":null,"url":null,"abstract":"Two-photon lithography has advantages for precise additive manufacturing at the nanoscale, but its printing speed is currently too slow for large-scale practical applications. A sensitive photoresist based on zirconium oxide hybrid nanoparticles is shown to increase the linear printing speed of two-photon lithography up to the order of metres per second.","PeriodicalId":18915,"journal":{"name":"Nature nanotechnology","volume":"19 1","pages":"11-12"},"PeriodicalIF":38.1000,"publicationDate":"2023-10-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Sensitive photoresists for high-speed two-photon lithography\",\"authors\":\"\",\"doi\":\"10.1038/s41565-023-01518-9\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Two-photon lithography has advantages for precise additive manufacturing at the nanoscale, but its printing speed is currently too slow for large-scale practical applications. A sensitive photoresist based on zirconium oxide hybrid nanoparticles is shown to increase the linear printing speed of two-photon lithography up to the order of metres per second.\",\"PeriodicalId\":18915,\"journal\":{\"name\":\"Nature nanotechnology\",\"volume\":\"19 1\",\"pages\":\"11-12\"},\"PeriodicalIF\":38.1000,\"publicationDate\":\"2023-10-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Nature nanotechnology\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.nature.com/articles/s41565-023-01518-9\",\"RegionNum\":1,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nature nanotechnology","FirstCategoryId":"88","ListUrlMain":"https://www.nature.com/articles/s41565-023-01518-9","RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Sensitive photoresists for high-speed two-photon lithography
Two-photon lithography has advantages for precise additive manufacturing at the nanoscale, but its printing speed is currently too slow for large-scale practical applications. A sensitive photoresist based on zirconium oxide hybrid nanoparticles is shown to increase the linear printing speed of two-photon lithography up to the order of metres per second.
期刊介绍：
Nature Nanotechnology is a prestigious journal that publishes high-quality papers in various areas of nanoscience and nanotechnology. The journal focuses on the design, characterization, and production of structures, devices, and systems that manipulate and control materials at atomic, molecular, and macromolecular scales. It encompasses both bottom-up and top-down approaches, as well as their combinations.
Furthermore, Nature Nanotechnology fosters the exchange of ideas among researchers from diverse disciplines such as chemistry, physics, material science, biomedical research, engineering, and more. It promotes collaboration at the forefront of this multidisciplinary field. The journal covers a wide range of topics, from fundamental research in physics, chemistry, and biology, including computational work and simulations, to the development of innovative devices and technologies for various industrial sectors such as information technology, medicine, manufacturing, high-performance materials, energy, and environmental technologies. It includes coverage of organic, inorganic, and hybrid materials.
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