会聚束电子衍射技术中定量对称测量算法的灵敏度

Q3 Immunology and Microbiology Applied Microscopy Pub Date : 2021-07-03 DOI:10.1186/s42649-021-00060-z
Hyeongsub So, Ro Woon Lee, Sung Taek Hong, Kyou-Hyun Kim
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引用次数: 2

摘要

我们研究了基于轮廓r因子(Rp)和归一化互相关(NCC)系数(γ)的对称量化算法的敏感性。利用Gatan数字显微镜软件中嵌入的DM (Digital Micrograph?)脚本编写对称量化程序。利用布洛赫方法,模拟了多种CBED模式,并用于研究对称量化算法的灵敏度。量化结果表明,即使应变值很小(<?1%),两个对称量化系数对结构变化也非常敏感。
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Sensitivity of quantitative symmetry measurement algorithms for convergent beam electron diffraction technique

We investigate the sensitivity of symmetry quantification algorithms based on the profile R-factor (Rp) and the normalized cross-correlation (NCC) coefficient (γ). A DM (Digital Micrograph?) script embedded in the Gatan digital microscopy software is used to develop the symmetry quantification program. Using the Bloch method, a variety of CBED patterns are simulated and used to investigate the sensitivity of symmetry quantification algorithms. The quantification results show that two symmetry quantification coefficients are significantly sensitive to structural changes even for small strain values of <?1%.

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来源期刊
Applied Microscopy
Applied Microscopy Immunology and Microbiology-Applied Microbiology and Biotechnology
CiteScore
3.40
自引率
0.00%
发文量
10
审稿时长
10 weeks
期刊介绍: Applied Microscopy is a peer-reviewed journal sponsored by the Korean Society of Microscopy. The journal covers all the interdisciplinary fields of technological developments in new microscopy methods and instrumentation and their applications to biological or materials science for determining structure and chemistry. ISSN: 22875123, 22874445.
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