pH对ITO镀膜玻璃基板上沉积CdO膜的影响

IF 1 4区 工程技术 Q4 ENGINEERING, MECHANICAL International Journal of Surface Science and Engineering Pub Date : 2018-02-28 DOI:10.1504/ijsurfse.2018.10011253
B. Altıokka, A. Yıldırım
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引用次数: 5

摘要

采用电沉积法在氧化铟锡(ITO)镀膜玻璃衬底上沉积了氧化CdO薄膜。将最终溶液的pH值从4调整到8,考察了pH值对膜的影响。在pH为5时薄膜厚度最大,XRD研究表明该薄膜具有较高的峰强度。光学研究表明,带隙变化在2.04 ~ 2.41 eV之间,与ph值有关。通过扫描电镜分析表面形貌,发现薄膜沉积致密,无空洞、裂纹或针孔。
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Effects of pH on CdO films deposited onto ITO coated glass substrates by electrodeposition
Thin films of CdO were deposited onto indium tin oxide (ITO) coated glass substrates using electrodeposition method. The pH of the final solutions was adjusted from 4 to 8 and effects of pH on the films were investigated. The maximum film thickness was reached at pH 5 and XRD studies showed that this film had relatively high peak intensities. Optical studies showed that band gap varies between 2.04 and 2.41 eV and depend on pH. The surface morphologies were analysed by SEM images and they revealed that films were deposited compact and there were no voids, cracks or pinholes.
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来源期刊
CiteScore
1.60
自引率
25.00%
发文量
21
审稿时长
>12 weeks
期刊介绍: IJSurfSE publishes refereed quality papers in the broad field of surface science and engineering including tribology, but with a special emphasis on the research and development in friction, wear, coatings and surface modification processes such as surface treatment, cladding, machining, polishing and grinding, across multiple scales from nanoscopic to macroscopic dimensions. High-integrity and high-performance surfaces of components have become a central research area in the professional community whose aim is to develop highly reliable ultra-precision devices.
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