纳米级自润滑Ti/MoS2纳米涂层的纳米力学和纳米摩擦学性能

IF 1 4区 工程技术 Q4 ENGINEERING, MECHANICAL International Journal of Surface Science and Engineering Pub Date : 2020-06-24 DOI:10.1504/ijsurfse.2020.10030169
Summèra Banday, M. F. Wani
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引用次数: 7

摘要

采用脉冲激光沉积法在Al-Si衬底上制备了厚度为99.79 nm的Ti/MoS2涂层。通过低载荷下的纳米压痕、纳米划痕和纳米磨损试验,获得了Ti/MoS2涂层的力学性能和纳米摩擦学性能。结果表明,Ti/MoS2涂层的杨氏模量和纳米硬度随载荷的增加而降低。摩擦系数随滑动距离的增加而减小,表明Ti/MoS2涂层具有自润滑性能。随着载荷的增加,Ti/MoS2涂层的磨损率由5.7 × 10−10 mm3/Nm增加到2.1 × 10−9 mm3/Nm。Ti/MoS2涂层的扫描探针图像显示涂层的塑性流动,表面无碎屑和裂纹。表明磨粒磨损是主要的磨损机理。
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Nanomechanical and nanotribological properties of self-lubricating Ti/MoS2 nanocoating at nanoscale level
Ti/MoS2 coating of thickness 99.79 nm was prepared by pulse laser deposition method on Al-Si substrate. Mechanical and nanotribological properties of Ti/MoS2 coating were obtained by carrying out nanoindentation, nanoscratch and nanowear tests at low loads. It was observed that Young's modulus and nanohardness of Ti/MoS2 coating decrease with increasing load. The coefficient of friction also decreases with the increase in sliding distance, which proves that Ti/MoS2 coating have self-lubricating property. The wear rate of Ti/MoS2 coating increases from 5.7 × 10−10 mm3/Nm to 2.1 × 10−9 mm3/Nm with the increase in load. Scanning probe microscope images of Ti/MoS2 coating shows the plastic flow of coating with no debris and cracks on the surface. It indicates that the abrasive wear is the main wear mechanism.
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来源期刊
CiteScore
1.60
自引率
25.00%
发文量
21
审稿时长
>12 weeks
期刊介绍: IJSurfSE publishes refereed quality papers in the broad field of surface science and engineering including tribology, but with a special emphasis on the research and development in friction, wear, coatings and surface modification processes such as surface treatment, cladding, machining, polishing and grinding, across multiple scales from nanoscopic to macroscopic dimensions. High-integrity and high-performance surfaces of components have become a central research area in the professional community whose aim is to develop highly reliable ultra-precision devices.
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