{"title":"半导体工业x射线计量教程。","authors":"D. Sunday, Wen-Li Wu, S. Barton, R. Joseph Kline","doi":"10.1002/HTTPS://DOI.ORG/10.6028/JRES.124.003","DOIUrl":null,"url":null,"abstract":"The semiconductor industry is in need of new, in-line dimensional metrology\n methods with higherspatial resolution for characterizing their next generation\n nanodevices. The purpose of this short course is to train the semiconductor industry\n on the NIST-developed critical dimension small angle X-ray scattering (CDSAXS)\n method. The topics will include both data processing and instrumentation. The short\n course will also provide an opportunity for discussion of the requirements for\n CDSAXS and the necessary improvements in X-ray source technology. Expected audience\n include semiconductor manufacturers, equipment manufacturers, and component\n manufacturers. The presentations were made at “X-ray Metrology for the Semiconductor\n Industry” short course at the National Institute of Standards and Technology on Aug.\n 25, 2016.","PeriodicalId":54766,"journal":{"name":"Journal of Research of the National Institute of Standards and Technology","volume":"124 1","pages":"1-3"},"PeriodicalIF":1.3000,"publicationDate":"2019-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"X-ray Metrology for the Semiconductor Industry Tutorial.\",\"authors\":\"D. Sunday, Wen-Li Wu, S. Barton, R. Joseph Kline\",\"doi\":\"10.1002/HTTPS://DOI.ORG/10.6028/JRES.124.003\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The semiconductor industry is in need of new, in-line dimensional metrology\\n methods with higherspatial resolution for characterizing their next generation\\n nanodevices. The purpose of this short course is to train the semiconductor industry\\n on the NIST-developed critical dimension small angle X-ray scattering (CDSAXS)\\n method. The topics will include both data processing and instrumentation. The short\\n course will also provide an opportunity for discussion of the requirements for\\n CDSAXS and the necessary improvements in X-ray source technology. Expected audience\\n include semiconductor manufacturers, equipment manufacturers, and component\\n manufacturers. The presentations were made at “X-ray Metrology for the Semiconductor\\n Industry” short course at the National Institute of Standards and Technology on Aug.\\n 25, 2016.\",\"PeriodicalId\":54766,\"journal\":{\"name\":\"Journal of Research of the National Institute of Standards and Technology\",\"volume\":\"124 1\",\"pages\":\"1-3\"},\"PeriodicalIF\":1.3000,\"publicationDate\":\"2019-02-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Research of the National Institute of Standards and Technology\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://doi.org/10.1002/HTTPS://DOI.ORG/10.6028/JRES.124.003\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"INSTRUMENTS & INSTRUMENTATION\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Research of the National Institute of Standards and Technology","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1002/HTTPS://DOI.ORG/10.6028/JRES.124.003","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"INSTRUMENTS & INSTRUMENTATION","Score":null,"Total":0}
X-ray Metrology for the Semiconductor Industry Tutorial.
The semiconductor industry is in need of new, in-line dimensional metrology
methods with higherspatial resolution for characterizing their next generation
nanodevices. The purpose of this short course is to train the semiconductor industry
on the NIST-developed critical dimension small angle X-ray scattering (CDSAXS)
method. The topics will include both data processing and instrumentation. The short
course will also provide an opportunity for discussion of the requirements for
CDSAXS and the necessary improvements in X-ray source technology. Expected audience
include semiconductor manufacturers, equipment manufacturers, and component
manufacturers. The presentations were made at “X-ray Metrology for the Semiconductor
Industry” short course at the National Institute of Standards and Technology on Aug.
25, 2016.
期刊介绍:
The Journal of Research of the National Institute of Standards and Technology is the flagship publication of the National Institute of Standards and Technology. It has been published under various titles and forms since 1904, with its roots as Scientific Papers issued as the Bulletin of the Bureau of Standards.
In 1928, the Scientific Papers were combined with Technologic Papers, which reported results of investigations of material and methods of testing. This new publication was titled the Bureau of Standards Journal of Research.
The Journal of Research of NIST reports NIST research and development in metrology and related fields of physical science, engineering, applied mathematics, statistics, biotechnology, information technology.