两种不同激发模式下大气压微等离子体射流的振幅和频率特性

IF 1.3 Q3 ORTHOPEDICS Plasma Research Express Pub Date : 2020-05-12 DOI:10.1088/2516-1067/ab8f39
K. Barman, Deepika Behmani, Mohit Mudgal, S. Bhattacharjee, R. Rane, S. Nema
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引用次数: 3

摘要

研究了大气压微等离子体射流在低频(~ 10 kHz)、高压(~ 15 kV) (LFHV)和高频(~ 80 kHz)、低压(4 kV) (HFLV)两种不同激励模式下的等离子体特性。在两种系统中,通过实验研究了交流电激励对等离子体的影响,这种影响取决于波幅和频率。研究了等离子体参数,如电子密度(ne)、电子激发温度(Texc),包括等离子体中不同物质的光强,作为外加电压、气体流速和工作频率的函数。对两种不同的等离子体系统进行了电学建模,发现模型的结果与实验结果相当吻合。研究发现,在一定的气体流速下,高通量高压系统的电子密度和温度均高于低通量高压系统,尽管低通量高压系统的外加电压更高。较低的Texc值对于LFHV系统可能使其适合于医学或生物应用。由于在HFLV系统中,在引脚电极尖端附近产生了一个大的电场,因此即使施加的电压低于LFHV系统,也可以很容易地产生等离子体。HFLV系统支持更高的Texc,这样的系统可以用于材料表面改性应用。
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Characteristics of atmospheric pressure micro-plasma jets in two different modes of excitation depending upon wave amplitude and frequency
The plasma characteristics of atmospheric pressure micro-plasma jets in two different modes of excitation: low frequency (∼10 kHz), high voltage (∼15 kV) (LFHV) and high frequency (∼80 kHz), low voltage (4 kV) (HFLV), are investigated. The effect of AC electrical excitation on the plasma, depending upon wave amplitude and frequency, are looked at experimentally in the two systems. Plasma parameters such as the electron density (ne), electron excitation temperature (Texc), including optical line intensities from different species in the plasma are investigated as a function of applied external voltage, gas flow rate and operating frequency. Electrical modelling of the two different plasma systems are carried out and the results from the models are found to agree reasonably well with those of the experiments. It is found that the electron density and the temperature of the HFLV system are higher than the LFHV system at a particular gas flow rate, although the external applied voltage is higher for the LFHV system. A lower value of Texc for the LFHV system may make it suitable for medical or biological applications. Since a large electric field is created near the tip of the pin electrode in the HFLV system, therefore even though the applied voltage is lower than the LFHV system, the plasma can be easily generated. The HFLV system support a higher Texc, and such a system could be useful for material surface modification applications.
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来源期刊
Plasma Research Express
Plasma Research Express Energy-Nuclear Energy and Engineering
CiteScore
2.60
自引率
0.00%
发文量
15
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