在晶体表面有对流项的薄膜涂层中杂质的扩散流激活的再结晶模型:精确解

IF 4.6 Q2 MATERIALS SCIENCE, BIOMATERIALS ACS Applied Bio Materials Pub Date : 2022-11-08 DOI:10.1051/mmnp/2022046
S. Savotchenko, A. Cherniakov
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引用次数: 0

摘要

考虑多晶与薄膜涂层之间杂质交换的对流通量,提出了两种再结晶模型。在含对流项的涂层表面边界条件下,用单相和两相Stefan问题描述了再结晶的特殊边界模式。得到了与晶界杂质浓度相对应的公式问题的精确解。针对第三类问题的详细理论分析表明,杂质浓度和再结晶层宽度随退火时间的增加而增加。多晶和涂层之间杂质交换强度的增加促进了再结晶层宽度的增加。再结晶前沿位置随杂质表面浓度的增加而增加,随杂质通量强度的增加而减小。再结晶动力学的速率随着多晶和涂层之间杂质交换强度的增加而增加
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Models of recrystallization activated by a diffusion flow of impurities from a thin-film coating with a convection term at the crystal surface: exact solutions
Two models of recrystallization are proposed taking into account the convective flux of impurity exchange between the polycrystalline and the thin-film coating. The special boundary modes of recrystallization described by the single-phase and two-phase Stefan problems with the boundary condition at coated surface containing the convective term. The exact solutions of the formulated problems corresponding to the grain-boundary concentration of impurities are obtained. The detail theoretical analysis focused on the third type problem shows that the concentration of impurities and the width of the recrystallized layer increase with an increase in the annealing time. An increase in intensity of impurity exchange between the polycrystalline and the coating promotes an increase in the width of the recrystallized layer. The recrystallization front position increases with an increase in the surface concentration of impurities and it decreases with an increase in the intensity of the impurity flux from the surface. The rate of recrystallization kinetics increases with an increase in the intensity of impurity exchange between the polycrystalline and the coating
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来源期刊
ACS Applied Bio Materials
ACS Applied Bio Materials Chemistry-Chemistry (all)
CiteScore
9.40
自引率
2.10%
发文量
464
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